<  Retour au portail Polytechnique Montréal

Documents dont l'auteur est "Gujrathi, S. C."

Monter d'un niveau
Pour citer ou exporter [feed] Atom [feed] RSS 1.0 [feed] RSS 2.0
Grouper par: Auteurs ou autrices | Date de publication | Sous-type de document | Aucun groupement
Nombre de documents: 28

Article de revue

Amassian, A., Dudek, M., Zabeida, O., Gujrathi, S. C., Sapieha, J.-E., & Martinu, L. (2009). Oxygen incorporation and charge donor activation via subplantation during growth of indium tin oxide films. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 27(2), 362-366. Lien externe

Benkahoul, M., Robin, P., Gujrathi, S. C., Martinu, L., & Sapieha, J.-E. (2008). Microstructure and Mechanical Properties of Cr-Si-N Coatings Prepared by Pulsed Reactive Dual Magnetron Sputtering. Surface and Coatings Technology, 202(16), 3975-3980. Lien externe

D'arcy Gall, J., Desjardins, P., Petrov, I., Greene, J. E., Paultre, J. E., Masut, R. A., Gujrathi, S. C., & Roorda, S. (2000). Epitaxial metastable Ge₁₋y Cy (y≤0.02) alloys grown on Ge(001) from hyperthermal beams: C incorporation and lattice sites. Journal of Applied Physics, 88(1), 96-104. Lien externe

Fortin, V., Gujrathi, S. C., Gagnon, G., Gauvin, R., Currie, J. F., Ouellet, L., & Tremblay, Y. (1999). Effect of in Situ Plasma Oxidation of Tin Diffusion Barrier for Alsicu/Tin/Ti Metallization Structure of Integrated Circuits. Journal of vacuum science & technology. B. Microelectronics and nanometer structures processing, measurement and phenomena, 17(2), 423-431. Lien externe

Hajek, V., Rusnak, K., Vlček, J., Martinu, L., & Gujrathi, S. C. (1999). Influence of substrate bias voltage on the properties of CNₓ films prepared by reactive magnetron sputtering. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 17(3), 899-908. Lien externe

Fortin, V., Gagnon, G., Caron, M., Gujrathi, S. C., Currie, J. F., Ouellet, L., Tremblay, Y., & Biberger, M. (1998). The determination of phases formed in AlSiCu/TiN/Ti contact metallization structure of integrated circuits by x-ray diffraction. Journal of Applied Physics, 83(1), 132-138. Lien externe

Gujrathi, S. C., Gagnon, G., Fortin, V., Caron, M., Currie, J. F., Ouellet, L., & Tremblay, Y. (1998). Elastic Recoil Detection Using Time-of-Flight for Analysis of Tin/Alsicu/Tin/Ti Contact Metallization Structures. Nuclear Instruments & Methods in Physics Research. Section B, Beam Interactions With Materials and Atoms, 138, 661-668. Lien externe

Sobrinho, A. S. D., Schühler, N., Sapieha, J.-E., Wertheimer, M. R., Andrews, M., & Gujrathi, S. C. (1998). Plasma-Deposited Silicon Oxide and Silicon Nitride Films on Poly(Ethylene Terephthalate): a Multitechnique Study of the Interphase Regions. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 16(4), 2021-2030. Lien externe

Gujrathi, S. C., Roorda, S., D'Arcy, J. G., Pflueger, R. L., Desjardins, P., Petrov, I., & Greene, J. E. (1998). Quantitative compositional depth profiling of Si₁₋ₓ₋yGeₓCy thin films by simultaneous elastic recoil detection and Rutherford backscattering spectrometry. Nuclear Instruments & Methods in Physics Research. Section B, Beam Interactions With Materials and Atoms, 136-138, 654-660. Lien externe

Poitras, D., Leroux, P., Sapieha, J.-E., Gujrathi, S. C., & Martinu, L. (1996). Characterization of homogeneous and inhomogeneous Si-based optical coatings deposited in dual-frequency plasma. Optical Engineering, 35(9), 2693-2699. Lien externe

Ouellet, O. L., Tremblay, Y., Gagnon, G., Caron, M., Currie, J. F., Gujrathi, S. C., Biberger, M., & Reynolds, R. (1996). The effect of an oxygen plasma exposure on the reliability of a ti/tin contact metallization. Journal of Applied Physics, 79(8, pt. 1), 4438-4443. Lien externe

Gagnon, G., Gujrathi, S. C., Caron, M., Currie, J. F., Tremblay, Y., Ouellet, L., Biberger, M., & Reynolds, R. (1996). Effect of the oxidation of TiN on the stability of the Al/TiN interface. Journal of Applied Physics, 80(1), 188-195. Lien externe

Ouellet, L., Tremblay, Y., Gagnon, G., Caron, M., Currie, J. F., Gujrathi, S. C., & Biberger, M. (1996). The effect of the Ti glue layer in an integrated Ti/TiN/Ti/AlSiCu/TiN contact metallization process. Journal of vacuum science & technology. B. Microelectronics and nanometer structures processing, measurement and phenomena, 14(4), 2627-2635. Lien externe

Ouellet, L., Tremblay, Y., Gagnon, G., Caron, M., Currie, J. F., Gujrathi, S. C., & Biberger, M. (1996). Effect of the Ti/TiN bilayer barrier and its surface treatment on the reliability of a Ti/TiN/AlSiCu/TiN contact metallization. Journal of vacuum science & technology. B. Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 3502-3508. Lien externe

Gujrathi, S. C., Poitras, D., Sapieha, J.-E., & Martinu, L. (1996). ERD-TOF characterization of silicon-compound multilayer and graded-index optical coatings. Nuclear Instruments & Methods in Physics Research. Section B, Beam Interactions With Materials and Atoms, 118(1-4), 560-565. Lien externe

Gagnon, G., Currie, J. F., Beique, G., Brebner, J. L., Gujrathi, S. C., & Ouellet, L. (1994). Characterization of reactively evaporated TiN layers for diffusion barrier applications. Journal of Applied Physics, 75(3), 1565-1570. Lien externe

Grüning, U., Gujrathi, S. C., Poulin, S., Diawara, Y., & Yelon, A. (1994). Remote oxygen-containing hydrogen plasma treatment of porous silicon. Journal of Applied Physics, 75(12), 8075-9. Lien externe

Martinu, L., Raveh, A., Domingue, A., Bertrand, L., Sapieha, J.-E., Gujrathi, S. C., & Wertheimer, M. R. (1992). Hard carbon films deposited under high ion flux. Thin Solid Films, 208(1), 42-47. Lien externe

Raveh, A., Martinu, L., Gujrathi, S. C., Sapieha, J.-E., & Wertheimer, M. R. (1992). Structure-property relationships in dual-frequency plasma deposited hard a-C : H films. Surface and Coatings Technology, 53(3), 275-282. Lien externe

Diawara, Y., Currie, J. F., Gujrathi, S. C., & Oxorn, K. (1989). Effet d'une pulvérisation de l'antimoine dans le a-Si: H. Canadian Journal of Physics, 67(10), 1007-1010. Lien externe

Blain, S., Sapieha, J.-E., Wertheimer, M. R., & Gujrathi, S. C. (1989). Silicon oxynitride from microwave plasma: fabrication and characterization. Canadian Journal of Physics, 67(4), 190-194. Lien externe

Bustarret, E., Bensouda, M., Habrard, M. C., Bruyère, J. C., Poulin, S., & Gujrathi, S. C. (1988). Configurational statistics in a-SixNyHz alloys : a quantitative bonding analysis. Physical Review B-Condens Matter and Materials Physics, 38(12), 8171-8184. Lien externe

Tessier, Y., Sapieha, J.-E., Poulin-Dandurand, S., Wertheimer, M. R., & Gujrathi, S. C. (1987). Silicon nitride from microwave plasma: fabrication and characterization. Canadian Journal of Physics, 65(8), 859-863. Lien externe

Communication écrite

Larouche, S., Amassian, A., Gujrathi, S. C., Sapieha, J.-E., & Martinu, L. (avril 2001). Multilayer and inhomogeneous optical filters fabricated by PECVD using titanium dioxide and silicon dioxide [Communication écrite]. 44th Annual Technical Conference, Philadelphia, PA, United States. Non disponible

Biederman, H., Stundzia, V., Slavínská, D., Bílková, P., Pešička, J., Hlídek, P., Zemek, J., Martinu, L., Sapieha, J.-E., & Gujrathi, S. C. (août 1997). Unbalanced magnetron deposition of composite metal/C:H films - a comparison of basic properties of Ag/C:H, Ni/C:H and Mo/C:H [Communication écrite]. 13th International Symposium on Plasma Chemistry (ISPC 1997), Beijing, China. Lien externe

Gagnon, G., Caron, M., Currie, J. F., Gujrathi, S. C., Fortin, V., Tremblay, Y., Oueller, L., Wang, M., Biberger, M., & Wong, F. (juin 1996). Effect of a TiN anti-reflecting coating on the performance of Ti/TiN/AlSiCu metallization of VLSI devices [Communication écrite]. 13th International VLSI Multilevel Interconnection (V-MIC) Conference, Santa Clara, CA, USA. Non disponible

Gagnon, G., Caron, M., Currie, J. F., Gujrathi, S. C., Fortin, V., Tremblay, Y., Ouellet, L., Wang, M., Biberger, M., & Wong, F. (juin 1996). Effect of the oxidation of TiN barrier on its efficiency as a diffusion barrier in AlSiCu metallization of VLSI devices [Communication écrite]. 13th International VLSI Multilevel Interconnection (V-MIC) Conference, Santa Clara, CA, USA. Non disponible

Poitras, D., Leroux, P., Sapieha, J.-E., Gujrathi, S. C., & Martinu, L. (mai 1994). Characterization of silicon-compound multilayer and graded-index optical coatings deposited by dual-frequency plasma [Communication écrite]. 37th Annual Technical Conference, Boston, MA, USA. Non disponible

Liste produite: Sat Dec 6 03:55:02 2025 EST.