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Items where Author is "Gujrathi, S. C."

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Number of items: 28.

Article

Amassian, A., Dudek, M., Zabeida, O., Gujrathi, S. C., Sapieha, J.-E., & Martinu, L. (2009). Oxygen incorporation and charge donor activation via subplantation during growth of indium tin oxide films. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 27(2), 362-366. External link

Benkahoul, M., Robin, P., Gujrathi, S. C., Martinu, L., & Sapieha, J.-E. (2008). Microstructure and Mechanical Properties of Cr-Si-N Coatings Prepared by Pulsed Reactive Dual Magnetron Sputtering. Surface and Coatings Technology, 202(16), 3975-3980. External link

D'arcy Gall, J., Desjardins, P., Petrov, I., Greene, J. E., Paultre, J. E., Masut, R. A., Gujrathi, S. C., & Roorda, S. (2000). Epitaxial metastable Ge₁₋y Cy (y≤0.02) alloys grown on Ge(001) from hyperthermal beams: C incorporation and lattice sites. Journal of Applied Physics, 88(1), 96-104. External link

Fortin, V., Gujrathi, S. C., Gagnon, G., Gauvin, R., Currie, J. F., Ouellet, L., & Tremblay, Y. (1999). Effect of in Situ Plasma Oxidation of Tin Diffusion Barrier for Alsicu/Tin/Ti Metallization Structure of Integrated Circuits. Journal of vacuum science & technology. B. Microelectronics and nanometer structures processing, measurement and phenomena, 17(2), 423-431. External link

Hajek, V., Rusnak, K., Vlček, J., Martinu, L., & Gujrathi, S. C. (1999). Influence of substrate bias voltage on the properties of CNₓ films prepared by reactive magnetron sputtering. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 17(3), 899-908. External link

Fortin, V., Gagnon, G., Caron, M., Gujrathi, S. C., Currie, J. F., Ouellet, L., Tremblay, Y., & Biberger, M. (1998). The determination of phases formed in AlSiCu/TiN/Ti contact metallization structure of integrated circuits by x-ray diffraction. Journal of Applied Physics, 83(1), 132-138. External link

Gujrathi, S. C., Gagnon, G., Fortin, V., Caron, M., Currie, J. F., Ouellet, L., & Tremblay, Y. (1998). Elastic Recoil Detection Using Time-of-Flight for Analysis of Tin/Alsicu/Tin/Ti Contact Metallization Structures. Nuclear Instruments & Methods in Physics Research. Section B, Beam Interactions With Materials and Atoms, 138, 661-668. External link

Sobrinho, A. S. D., Schühler, N., Sapieha, J.-E., Wertheimer, M. R., Andrews, M., & Gujrathi, S. C. (1998). Plasma-Deposited Silicon Oxide and Silicon Nitride Films on Poly(Ethylene Terephthalate): a Multitechnique Study of the Interphase Regions. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 16(4), 2021-2030. External link

Gujrathi, S. C., Roorda, S., D'Arcy, J. G., Pflueger, R. L., Desjardins, P., Petrov, I., & Greene, J. E. (1998). Quantitative compositional depth profiling of Si₁₋ₓ₋yGeₓCy thin films by simultaneous elastic recoil detection and Rutherford backscattering spectrometry. Nuclear Instruments & Methods in Physics Research. Section B, Beam Interactions With Materials and Atoms, 136-138, 654-660. External link

Poitras, D., Leroux, P., Sapieha, J.-E., Gujrathi, S. C., & Martinu, L. (1996). Characterization of homogeneous and inhomogeneous Si-based optical coatings deposited in dual-frequency plasma. Optical Engineering, 35(9), 2693-2699. External link

Ouellet, O. L., Tremblay, Y., Gagnon, G., Caron, M., Currie, J. F., Gujrathi, S. C., Biberger, M., & Reynolds, R. (1996). The effect of an oxygen plasma exposure on the reliability of a ti/tin contact metallization. Journal of Applied Physics, 79(8, pt. 1), 4438-4443. External link

Gagnon, G., Gujrathi, S. C., Caron, M., Currie, J. F., Tremblay, Y., Ouellet, L., Biberger, M., & Reynolds, R. (1996). Effect of the oxidation of TiN on the stability of the Al/TiN interface. Journal of Applied Physics, 80(1), 188-195. External link

Ouellet, L., Tremblay, Y., Gagnon, G., Caron, M., Currie, J. F., Gujrathi, S. C., & Biberger, M. (1996). The effect of the Ti glue layer in an integrated Ti/TiN/Ti/AlSiCu/TiN contact metallization process. Journal of vacuum science & technology. B. Microelectronics and nanometer structures processing, measurement and phenomena, 14(4), 2627-2635. External link

Ouellet, L., Tremblay, Y., Gagnon, G., Caron, M., Currie, J. F., Gujrathi, S. C., & Biberger, M. (1996). Effect of the Ti/TiN bilayer barrier and its surface treatment on the reliability of a Ti/TiN/AlSiCu/TiN contact metallization. Journal of vacuum science & technology. B. Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 3502-3508. External link

Gujrathi, S. C., Poitras, D., Sapieha, J.-E., & Martinu, L. (1996). ERD-TOF characterization of silicon-compound multilayer and graded-index optical coatings. Nuclear Instruments & Methods in Physics Research. Section B, Beam Interactions With Materials and Atoms, 118(1-4), 560-565. External link

Gagnon, G., Currie, J. F., Beique, G., Brebner, J. L., Gujrathi, S. C., & Ouellet, L. (1994). Characterization of reactively evaporated TiN layers for diffusion barrier applications. Journal of Applied Physics, 75(3), 1565-1570. External link

Grüning, U., Gujrathi, S. C., Poulin, S., Diawara, Y., & Yelon, A. (1994). Remote oxygen-containing hydrogen plasma treatment of porous silicon. Journal of Applied Physics, 75(12), 8075-9. External link

Martinu, L., Raveh, A., Domingue, A., Bertrand, L., Sapieha, J.-E., Gujrathi, S. C., & Wertheimer, M. R. (1992). Hard carbon films deposited under high ion flux. Thin Solid Films, 208(1), 42-47. External link

Raveh, A., Martinu, L., Gujrathi, S. C., Sapieha, J.-E., & Wertheimer, M. R. (1992). Structure-property relationships in dual-frequency plasma deposited hard a-C : H films. Surface and Coatings Technology, 53(3), 275-282. External link

Diawara, Y., Currie, J. F., Gujrathi, S. C., & Oxorn, K. (1989). Effet d'une pulvérisation de l'antimoine dans le a-Si: H. Canadian Journal of Physics, 67(10), 1007-1010. External link

Blain, S., Sapieha, J.-E., Wertheimer, M. R., & Gujrathi, S. C. (1989). Silicon oxynitride from microwave plasma: fabrication and characterization. Canadian Journal of Physics, 67(4), 190-194. External link

Bustarret, E., Bensouda, M., Habrard, M. C., Bruyère, J. C., Poulin, S., & Gujrathi, S. C. (1988). Configurational statistics in a-SixNyHz alloys : a quantitative bonding analysis. Physical Review B-Condens Matter and Materials Physics, 38(12), 8171-8184. External link

Tessier, Y., Sapieha, J.-E., Poulin-Dandurand, S., Wertheimer, M. R., & Gujrathi, S. C. (1987). Silicon nitride from microwave plasma: fabrication and characterization. Canadian Journal of Physics, 65(8), 859-863. External link

Paper

Larouche, S., Amassian, A., Gujrathi, S. C., Sapieha, J.-E., & Martinu, L. (2001, April). Multilayer and inhomogeneous optical filters fabricated by PECVD using titanium dioxide and silicon dioxide [Paper]. 44th Annual Technical Conference, Philadelphia, PA, United States. Unavailable

Biederman, H., Stundzia, V., Slavínská, D., Bílková, P., Pešička, J., Hlídek, P., Zemek, J., Martinu, L., Sapieha, J.-E., & Gujrathi, S. C. (1997, August). Unbalanced magnetron deposition of composite metal/C:H films - a comparison of basic properties of Ag/C:H, Ni/C:H and Mo/C:H [Paper]. 13th International Symposium on Plasma Chemistry (ISPC 1997), Beijing, China. External link

Gagnon, G., Caron, M., Currie, J. F., Gujrathi, S. C., Fortin, V., Tremblay, Y., Oueller, L., Wang, M., Biberger, M., & Wong, F. (1996, June). Effect of a TiN anti-reflecting coating on the performance of Ti/TiN/AlSiCu metallization of VLSI devices [Paper]. 13th International VLSI Multilevel Interconnection (V-MIC) Conference, Santa Clara, CA, USA. Unavailable

Gagnon, G., Caron, M., Currie, J. F., Gujrathi, S. C., Fortin, V., Tremblay, Y., Ouellet, L., Wang, M., Biberger, M., & Wong, F. (1996, June). Effect of the oxidation of TiN barrier on its efficiency as a diffusion barrier in AlSiCu metallization of VLSI devices [Paper]. 13th International VLSI Multilevel Interconnection (V-MIC) Conference, Santa Clara, CA, USA. Unavailable

Poitras, D., Leroux, P., Sapieha, J.-E., Gujrathi, S. C., & Martinu, L. (1994, May). Characterization of silicon-compound multilayer and graded-index optical coatings deposited by dual-frequency plasma [Paper]. 37th Annual Technical Conference, Boston, MA, USA. Unavailable

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