V. Hajek, K. Rusnak, J. Vlček, Ludvik Martinu
and S. C. Gujrathi
Article (1999)
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| Additional Information: | Nom historique du département: Département de génie physique et de génie des matériaux |
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| Department: | Department of Engineering Physics |
| Research Center: | GCM - Thin Film Physics and Technology Research Group |
| PolyPublie URL: | https://publications.polymtl.ca/28911/ |
| Journal Title: | Journal of vacuum science and technology. A, Vacuum, surfaces, and films (vol. 17, no. 3) |
| Publisher: | American Vacuum Society |
| DOI: | 10.1116/1.581662 |
| Official URL: | https://doi.org/10.1116/1.581662 |
| Date Deposited: | 18 Apr 2023 15:22 |
| Last Modified: | 08 Apr 2025 02:18 |
| Cite in APA 7: | Hajek, V., Rusnak, K., Vlček, J., Martinu, L., & Gujrathi, S. C. (1999). Influence of substrate bias voltage on the properties of CNₓ films prepared by reactive magnetron sputtering. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 17(3), 899-908. https://doi.org/10.1116/1.581662 |
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