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Influence of substrate bias voltage on the properties of CNₓ films prepared by reactive magnetron sputtering

V. Hajek, K. Rusnak, J. Vlcek, Ludvik Martinu and S. C. Gujrathi

Article (1999)

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Additional Information: Nom historique du département: Département de génie physique et de génie des matériaux
Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/28911/
Journal Title: Journal of vacuum science and technology. A, Vacuum, surfaces, and films (vol. 17, no. 3)
Publisher: American Vacuum Society
DOI: 10.1116/1.581662
Official URL: https://doi.org/10.1116/1.581662
Date Deposited: 18 Apr 2023 15:22
Last Modified: 05 Apr 2024 11:17
Cite in APA 7: Hajek, V., Rusnak, K., Vlcek, J., Martinu, L., & Gujrathi, S. C. (1999). Influence of substrate bias voltage on the properties of CNₓ films prepared by reactive magnetron sputtering. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 17(3), 899-908. https://doi.org/10.1116/1.581662

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