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Hajek, V., Rusnak, K., Vlcek, J., Martinu, L., & Gujrathi, S. C. (1999). Influence of substrate bias voltage on the properties of CNₓ films prepared by reactive magnetron sputtering. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 17(3), 899-908. Lien externe
Hajek, V., Rusnak, K., Vlcek, J., Martinu, L., & Hawthorne, H. M. (1997). Tribological study of CNₓ films prepared by reactive d.c. magnetron sputtering. Wear, 213(1-2), 80-89. Lien externe
Vlcek, J., Rusnak, K., Hajek, V., & Martinu, L. (mars 2000). Characterization of ion bombardment and optical emission spectroscopy in magnetron discharges for reactive sputtering of hard carbon nitride films [Résumé]. International Symposium on Trends and Applications of Thin Films (TATF 2000), Nancy, France. Publié dans Vide, 54(295 SUP1/4). Non disponible
Vlcek, J., Rusnak, K., Hajek, V., & Martinu, L. (2000). New Approach to Understanding the Reactive Magnetron Sputtering of Hard Carbon Nitride Films. Diamond and Related Materials, 9(3-6), 582-586. Lien externe
