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Characterization of ion bombardment and optical emission spectroscopy in magnetron discharges for reactive sputtering of hard carbon nitride films

J. Vlcek, K. Rusnak, V. Hajek and Ludvik Martinu

Abstract (2000)

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Additional Information: Nom historique du département: Département de génie physique et de génie des matériaux
Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/27759/
Conference Title: International Symposium on Trends and Applications of Thin Films (TATF 2000)
Conference Location: Nancy, France
Conference Date(s): 2000-03-28
Journal Title: Vide (vol. 54, no. 295 SUP1/4)
Date Deposited: 18 Apr 2023 15:22
Last Modified: 05 Apr 2024 11:15
Cite in APA 7: Vlcek, J., Rusnak, K., Hajek, V., & Martinu, L. (2000, March). Characterization of ion bombardment and optical emission spectroscopy in magnetron discharges for reactive sputtering of hard carbon nitride films [Abstract]. International Symposium on Trends and Applications of Thin Films (TATF 2000), Nancy, France. Published in Vide, 54(295 SUP1/4).

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