J. Vlček, K. Rusnak, V. Hajek and Ludvik Martinu
Article (2000)
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| Additional Information: | Nom historique du département: Département de génie physique et de génie des matériaux |
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| Department: | Department of Engineering Physics |
| PolyPublie URL: | https://publications.polymtl.ca/27758/ |
| Journal Title: | Diamond and Related Materials (vol. 9, no. 3-6) |
| Publisher: | Elsevier |
| DOI: | 10.1016/s0925-9635(99)00350-7 |
| Official URL: | https://doi.org/10.1016/s0925-9635%2899%2900350-7 |
| Date Deposited: | 18 Apr 2023 15:22 |
| Last Modified: | 08 Apr 2025 02:17 |
| Cite in APA 7: | Vlček, J., Rusnak, K., Hajek, V., & Martinu, L. (2000). New Approach to Understanding the Reactive Magnetron Sputtering of Hard Carbon Nitride Films. Diamond and Related Materials, 9(3-6), 582-586. https://doi.org/10.1016/s0925-9635%2899%2900350-7 |
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