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New Approach to Understanding the Reactive Magnetron Sputtering of Hard Carbon Nitride Films

J. Vlcek, K. Rusnak, V. Hajek and Ludvik Martinu

Article (2000)

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Additional Information: Nom historique du département: Département de génie physique et de génie des matériaux
Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/27758/
Journal Title: Diamond and Related Materials (vol. 9, no. 3-6)
Publisher: Elsevier
DOI: 10.1016/s0925-9635(99)00350-7
Official URL: https://doi.org/10.1016/s0925-9635%2899%2900350-7
Date Deposited: 18 Apr 2023 15:22
Last Modified: 05 Apr 2024 11:15
Cite in APA 7: Vlcek, J., Rusnak, K., Hajek, V., & Martinu, L. (2000). New Approach to Understanding the Reactive Magnetron Sputtering of Hard Carbon Nitride Films. Diamond and Related Materials, 9(3-6), 582-586. https://doi.org/10.1016/s0925-9635%2899%2900350-7

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