U. Gruning, S. C. Gujrathi, Suzie Poulin, Y. Diawara and Arthur Yelon
Article (1994)
An external link is available for this itemDepartment: | Department of Engineering Physics |
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PolyPublie URL: | https://publications.polymtl.ca/33249/ |
Journal Title: | Journal of Applied Physics (vol. 75, no. 12) |
Publisher: | American Institute of Physics |
DOI: | 10.1063/1.356550 |
Official URL: | https://doi.org/10.1063/1.356550 |
Date Deposited: | 18 Apr 2023 15:25 |
Last Modified: | 25 Sep 2024 16:15 |
Cite in APA 7: | Gruning, U., Gujrathi, S. C., Poulin, S., Diawara, Y., & Yelon, A. (1994). Remote oxygen-containing hydrogen plasma treatment of porous silicon. Journal of Applied Physics, 75(12), 8075-9. https://doi.org/10.1063/1.356550 |
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