<  Back to the Polytechnique Montréal portal

Remote oxygen-containing hydrogen plasma treatment of porous silicon

U. Gruning, S. C. Gujrathi, Suzie Poulin, Y. Diawara and Arthur Yelon

Article (1994)

An external link is available for this item
Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/33249/
Journal Title: Journal of Applied Physics (vol. 75, no. 12)
Publisher: American Institute of Physics
DOI: 10.1063/1.356550
Official URL: https://doi.org/10.1063/1.356550
Date Deposited: 18 Apr 2023 15:25
Last Modified: 05 Apr 2024 11:24
Cite in APA 7: Gruning, U., Gujrathi, S. C., Poulin, S., Diawara, Y., & Yelon, A. (1994). Remote oxygen-containing hydrogen plasma treatment of porous silicon. Journal of Applied Physics, 75(12), 8075-9. https://doi.org/10.1063/1.356550

Statistics

Dimensions

Repository Staff Only

View Item View Item