Gérald Gagnon, M. Caron, John F. Currie, S. C. Gujrathi, V. Fortin, Y. Tremblay, L. Ouellet, M. Wang, M. Biberger and F. Wong
Paper (1996)
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| Additional Information: | Nom historique du département: Département de métallurgie et de génie des matériaux |
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| Department: | Department of Engineering Physics |
| PolyPublie URL: | https://publications.polymtl.ca/31311/ |
| Conference Title: | 13th International VLSI Multilevel Interconnection (V-MIC) Conference |
| Conference Location: | Santa Clara, CA, USA |
| Conference Date(s): | 1996-06-18 - 1996-06-20 |
| Publisher: | VMIC Tampa, FL, USA |
| Date Deposited: | 18 Apr 2023 15:24 |
| Last Modified: | 25 Sep 2024 16:13 |
| Cite in APA 7: | Gagnon, G., Caron, M., Currie, J. F., Gujrathi, S. C., Fortin, V., Tremblay, Y., Ouellet, L., Wang, M., Biberger, M., & Wong, F. (1996, June). Effect of the oxidation of TiN barrier on its efficiency as a diffusion barrier in AlSiCu metallization of VLSI devices [Paper]. 13th International VLSI Multilevel Interconnection (V-MIC) Conference, Santa Clara, CA, USA. |
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