Structure-property relationships in dual-frequency plasma deposited hard a-C : H films

A. Raveh, Ludvik Martinu, S. C. Gujrathi, Jolanta-Ewa Sapieha and Michael R. Wertheimer

Article (1992)

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Department:	Department of Engineering Physics
Research Center:	GCM - Thin Film Physics and Technology Research Group
PolyPublie URL:	https://publications.polymtl.ca/38288/
Journal Title:	Surface and Coatings Technology (vol. 53, no. 3)
Publisher:	Elsevier
DOI:	10.1016/0257-8972(92)90386-o
Official URL:	https://doi.org/10.1016/0257-8972%2892%2990386-o
Date Deposited:	18 Apr 2023 15:26
Last Modified:	25 Sep 2024 16:22

Cite in APA 7:	Raveh, A., Martinu, L., Gujrathi, S. C., Sapieha, J.-E., & Wertheimer, M. R. (1992). Structure-property relationships in dual-frequency plasma deposited hard a-C : H films. Surface and Coatings Technology, 53(3), 275-282. https://doi.org/10.1016/0257-8972%2892%2990386-o
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