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Claude, R., Moisan, M., & Wertheimer, M. R. (2011). RF and Microwave Plasma Deposition of Polymer Films: Effect of Frequency. MRS Proceedings, 68. Lien externe
Campillo, C., Ilias, S., Borges, C. F. M., Moisan, M., & Martinu, L. (2001). Enhanced Diamond Film Adhesion on Cobalt-Cemented Wc Substrates. New Diamond and Frontier Carbon Technology, 11(2), 147-156. Lien externe
Moisan, M., Barbeau, J., Moreau, S., Pelletier, J., Tabrizian, M., & Yahia, L. (2001). Low-Temperature Sterilization Using Gas Plasmas: a Review of the Experiments and an Analysis of the Inactivation Mechanisms. International Journal of Pharmaceutics, 226(1-2), 1-21. Lien externe
Moreau, S., Moisan, M., Tabrizian, M., Barbeau, J., Pelletier, J., Ricard, A., & Yahia, L. (2000). Using the Flowing Afterglow of a Plasma to Inactivate Bacillus Subtilis Spores: Influence of the Operating Conditions. Journal of Applied Physics, 88(2), 1166-1174. Lien externe
Fozza, A. C., Moisan, M., & Wertheimer, M. R. (2000). Vacuum Ultraviolet to Visible Emission From Hydrogen Plasma: Effect of Excitation Frequency. Journal of Applied Physics, 88(1), 20-33. Lien externe
Moreau, S., Tabrizian, M., Barbeau, J., Moisan, M., Leduc, A., Pelletier, J., Lagarde, T., Rohr, M., Desor, F., Vidal, D., & Yahia, L. (juillet 1999). Essential parameters for plasma sterilization [Communication écrite]. International Conference on Phenomena in Ionized Gazes (XXIV ICPIG), Warsaw, Poland. Non disponible
Schelz, S., Martinu, L., & Moisan, M. (1998). Diamond Nucleation Enhancement by Pretreating the Silicon Substrate With a Fluorocarbon Plasma. Diamond and Related Materials, 7(9), 1291-1302. Lien externe
Schelz, S., Borges, C. F. M., Martinu, L., & Moisan, M. (1997). Chemical vapor deposition of diamond films on hydrofluoric acid etched silicon substrates. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 15(5), 2743-2749. Lien externe
Schelz, S., Borges, C. F. M., Martinu, L., & Moisan, M. (1997). Diamond nucleation enhancement by hydrofluoric acid etching of silicon substrate. Diamond and Related Materials, 6(2-4), 440-443. Lien externe
Wertheimer, M. R., Martinu, L., & Moisan, M. (1997). Microwave and Dual-Frequency Plasma Processing. Dans d'Agostino, R., Favia, P., & Fracassi, F. (édit.), Plasma Processing of Polymers (p. 101-127). Lien externe
Borges, C. F. M., Schelz, S., Martinu, L., & Moisan, M. (1996). Adhesion of CVD diamond films on silicon substrates of different crystallographic orientations. Diamond and Related Materials, 5(12), 1402-1406. Lien externe
Borges, C. F. M., Schelz, S., St Onge, L., Moisan, M., & Martinu, L. (1996). Silicon contamination of diamond films deposited on silicon substrates in fused silica based reactors. Journal of Applied Physics, 79(6), 3290-3298. Lien externe
Wertheimer, M. R., & Moisan, M. (1994). Processing of electronic materials by microwave plasma. Pure and Applied Chemistry, 66(6), 1343-1352. Lien externe
Moisan, M., & Wertheimer, M. R. (1993). Comparison of microwave and r.f. plasmas: fundamentals and applications. Surface and Coatings Technology, 59(1), 1-13. Lien externe
Amyot, N., Sapieha, J.-E., Wertheimer, M. R., Ségui, Y., & Moisan, M. (1992). Electrical and structural studies of plasma-polymerized fluorocarbon films. IEEE Transactions on Electrical Insulation, 27(6), 1101-1107. Lien externe
Moisan, M., Barbeau, C., Claude, R., Ferreira, C. M., Margot, J., Paraszczak, J., Sá, A. B., Sauvé, G., & Wertheimer, M. R. (1991). Radio frequency or microwave plasma reactors? Factors determining the optimum frequency of operation. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 9(1), 8-25. Lien externe
Amyot, N., Wertheimer, M. R., Segui, Y., & Moisan, M. (octobre 1990). Electrical and structural studies of plasma-polymerized fluorocarbon films [Communication écrite]. Annual Conference on Electrical Insulation and Dielectric Phenomena, Pocono Manor, PA, USA. Lien externe
Wertheimer, M. R., Moisan, M., Sapieha, J.-E., & Claude, R. (1988). Effect of frequency from 'low frequency' to microwave on the plasma deposition of thin films. Pure and Applied Chemistry, 60(5), 815-815. Lien externe
Claude, R., Moisan, M., Wertheimer, M. R., & Zakrzewski, Z. (1987). Comparison of microwave and lower-frequency discharges for plasma polymerization. Plasma Chemistry and Plasma Processing, 7(4), 451-464. Lien externe
Paquin, L., Masson, D., Wertheimer, M. R., & Moisan, M. (1985). Amorphous silicon for photovoltaics produced by new microwave plasma-deposition techniques. Canadian Journal of Physics, 63(6), 831-837. Lien externe
Wertheimer, M. R., & Moisan, M. (1985). Comparison of microwave and lower frequency plasmas for thin film deposition and etching. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 3(6), 2643-2649. Lien externe
