Michael R. Wertheimer
and M. Moisan
Article (1985)
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| Department: | Department of Engineering Physics |
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| Research Center: | GCM - Thin Film Physics and Technology Research Group |
| PolyPublie URL: | https://publications.polymtl.ca/38244/ |
| Journal Title: | Journal of vacuum science and technology. A, Vacuum, surfaces, and films (vol. 3, no. 6) |
| Publisher: | American Vacuum Society |
| DOI: | 10.1116/1.572805 |
| Official URL: | https://doi.org/10.1116/1.572805 |
| Date Deposited: | 18 Apr 2023 15:26 |
| Last Modified: | 25 Sep 2024 16:22 |
| Cite in APA 7: | Wertheimer, M. R., & Moisan, M. (1985). Comparison of microwave and lower frequency plasmas for thin film deposition and etching. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 3(6), 2643-2649. https://doi.org/10.1116/1.572805 |
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