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Comparison of microwave and lower frequency plasmas for thin film deposition and etching

Michael R. Wertheimer and M. Moisan

Article (1985)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/38244/
Journal Title: Journal of vacuum science and technology. A, Vacuum, surfaces, and films (vol. 3, no. 6)
Publisher: American Vacuum Society
DOI: 10.1116/1.572805
Official URL: https://doi.org/10.1116/1.572805
Date Deposited: 18 Apr 2023 15:26
Last Modified: 05 Apr 2024 11:32
Cite in APA 7: Wertheimer, M. R., & Moisan, M. (1985). Comparison of microwave and lower frequency plasmas for thin film deposition and etching. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 3(6), 2643-2649. https://doi.org/10.1116/1.572805

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