Michael R. Wertheimer
, M. Moisan, Jolanta-Ewa Sapieha and R. Claude
Article (1988)
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| Department: | Department of Engineering Physics |
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| PolyPublie URL: | https://publications.polymtl.ca/38245/ |
| Journal Title: | Pure and Applied Chemistry (vol. 60, no. 5) |
| DOI: | 10.1351/pac198860050815 |
| Official URL: | https://doi.org/10.1351/pac198860050815 |
| Date Deposited: | 18 Apr 2023 15:26 |
| Last Modified: | 08 Apr 2025 07:01 |
| Cite in APA 7: | Wertheimer, M. R., Moisan, M., Sapieha, J.-E., & Claude, R. (1988). Effect of frequency from 'low frequency' to microwave on the plasma deposition of thin films. Pure and Applied Chemistry, 60(5), 815-815. https://doi.org/10.1351/pac198860050815 |
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