<  Back to the Polytechnique Montréal portal

Effect of frequency from 'low frequency' to microwave on the plasma deposition of thin films

Michael R. Wertheimer, M. Moisan, Jolanta-Ewa Sapieha and R. Claude

Article (1988)

An external link is available for this item
Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/38245/
Journal Title: Pure and Applied Chemistry (vol. 60, no. 5)
DOI: 10.1351/pac198860050815
Official URL: https://doi.org/10.1351/pac198860050815
Date Deposited: 18 Apr 2023 15:26
Last Modified: 05 Apr 2024 11:32
Cite in APA 7: Wertheimer, M. R., Moisan, M., Sapieha, J.-E., & Claude, R. (1988). Effect of frequency from 'low frequency' to microwave on the plasma deposition of thin films. Pure and Applied Chemistry, 60(5), 815-815. https://doi.org/10.1351/pac198860050815

Statistics

Dimensions

Repository Staff Only

View Item View Item