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Documents dont l'auteur est "Claude, R."

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Nombre de documents: 4

C

Claude, R., Moisan, M., & Wertheimer, M. R. (2011). RF and Microwave Plasma Deposition of Polymer Films: Effect of Frequency. MRS Proceedings, 68. Lien externe

Claude, R., Moisan, M., Wertheimer, M. R., & Zakrzewski, Z. (1987). Comparison of microwave and lower-frequency discharges for plasma polymerization. Plasma Chemistry and Plasma Processing, 7(4), 451-464. Lien externe

M

Moisan, M., Barbeau, C., Claude, R., Ferreira, C. M., Margot, J., Paraszczak, J., Sá, A. B., Sauvé, G., & Wertheimer, M. R. (1991). Radio frequency or microwave plasma reactors? Factors determining the optimum frequency of operation. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 9(1), 8-25. Lien externe

W

Wertheimer, M. R., Moisan, M., Sapieha, J.-E., & Claude, R. (1988). Effect of frequency from 'low frequency' to microwave on the plasma deposition of thin films. Pure and Applied Chemistry, 60(5), 815-815. Lien externe

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