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Chemical vapor deposition of diamond films on hydrofluoric acid etched silicon substrates

S. Schelz, C. F. M. Borges, Ludvik Martinu and M. Moisan

Article (1997)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/41809/
Journal Title: Journal of vacuum science and technology. A, Vacuum, surfaces, and films (vol. 15, no. 5)
Publisher: American Institute of Physics
DOI: 10.1116/1.580938
Official URL: https://doi.org/10.1116/1.580938
Date Deposited: 18 Apr 2023 15:23
Last Modified: 05 Apr 2024 11:38
Cite in APA 7: Schelz, S., Borges, C. F. M., Martinu, L., & Moisan, M. (1997). Chemical vapor deposition of diamond films on hydrofluoric acid etched silicon substrates. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 15(5), 2743-2749. https://doi.org/10.1116/1.580938

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