C. F. M. Borges, S. Schelz, L. St Onge, M. Moisan and Ludvik Martinu
Article (1996)
An external link is available for this itemDepartment: | Department of Engineering Physics |
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PolyPublie URL: | https://publications.polymtl.ca/31482/ |
Journal Title: | Journal of Applied Physics (vol. 79, no. 6) |
Publisher: | American Institute of Physics |
DOI: | 10.1063/1.361228 |
Official URL: | https://doi.org/10.1063/1.361228 |
Date Deposited: | 18 Apr 2023 15:24 |
Last Modified: | 25 Sep 2024 16:13 |
Cite in APA 7: | Borges, C. F. M., Schelz, S., St Onge, L., Moisan, M., & Martinu, L. (1996). Silicon contamination of diamond films deposited on silicon substrates in fused silica based reactors. Journal of Applied Physics, 79(6), 3290-3298. https://doi.org/10.1063/1.361228 |
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