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Silicon contamination of diamond films deposited on silicon substrates in fused silica based reactors

C. F. M. Borges, S. Schelz, L. St Onge, M. Moisan and Ludvik Martinu

Article (1996)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/31482/
Journal Title: Journal of Applied Physics (vol. 79, no. 6)
Publisher: American Institute of Physics
DOI: 10.1063/1.361228
Official URL: https://doi.org/10.1063/1.361228
Date Deposited: 18 Apr 2023 15:24
Last Modified: 05 Apr 2024 11:21
Cite in APA 7: Borges, C. F. M., Schelz, S., St Onge, L., Moisan, M., & Martinu, L. (1996). Silicon contamination of diamond films deposited on silicon substrates in fused silica based reactors. Journal of Applied Physics, 79(6), 3290-3298. https://doi.org/10.1063/1.361228

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