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Documents dont l'auteur est "Hala, M."

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Aller à : 2014 | 2013 | 2012 | 2011 | 2010
Nombre de documents: 8

2014

Hala, M., Vernhes, R., Zabeida, O., Sapieha, J.-E., & Martinu, L. (2014). Reactive HiPIMS deposition of SiO₂/Ta₂O₅ optical interference filters. Journal of Applied Physics, 116(21), 213302-213302. Lien externe

2013

Capek, J., Hala, M., Zabeida, O., Sapieha, J.-E., & Martinu, L. (2013). Deposition rate enhancement in HiPIMS without compromising the ionized fraction of the deposition flux. Journal of Physics D: Applied Physics, 46(20), 10 pages. Lien externe

2012

Hala, M., Capek, J., Zabeida, O., Sapieha, J.-E., & Martinu, L. (2012). Hysteresis-Free Deposition of Niobium Oxide Films by Hipims Using Different Pulse Management Strategies. Journal of Physics D: Applied Physics, 45(5). Lien externe

Hala, M., Capek, J., Zabeida, O., Sapieha, J.-E., & Martinu, L. (2012). Pulse Management in High Power Pulsed Magnetron Sputtering of Niobium. Surface and Coatings Technology, 206(19-20), 4186-4193. Lien externe

Anders, A., Capek, J., Hala, M., & Martinu, L. (2012). The 'Recycling Trap': a Generalized Explanation of Discharge Runaway in High-Power Impulse Magnetron Sputtering. Journal of Physics D: Applied Physics, 45(1), 5-5. Lien externe

Capek, J., Hala, M., Zabeida, O., Sapieha, J.-E., & Martinu, L. (2012). Steady State Discharge Optimization in High-Power Impulse Magnetron Sputtering Through the Control of the Magnetic Field. Journal of Applied Physics, 111(2), 9 pages. Lien externe

2011

Hala, M., Zabeida, O., Sapieha, J.-E., & Martinu, L. (2011). Dynamics of HiPIMS discharge operated in oxygen. IEEE Transactions on Plasma Science, 39(11), 2582-2583. Lien externe

2010

Hala, M., Viau, N., Zabeida, O., Sapieha, J.-E., & Martinu, L. (2010). Dynamics of reactive high-power impulse magnetron sputtering discharge studied by time- and space-resolved optical emission spectroscopy and fast imaging. Journal of Applied Physics, 107(4), 043305. Lien externe

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