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Deposition rate enhancement in HiPIMS without compromising the ionized fraction of the deposition flux

J. Capek, M. Hala, O. Zabeida, Jolanta-Ewa Sapieha and Ludvik Martinu

Article (2013)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/14158/
Journal Title: Journal of Physics D: Applied Physics (vol. 46, no. 20)
Publisher: IOP Publishing
DOI: 10.1088/0022-3727/46/20/205205
Official URL: https://doi.org/10.1088/0022-3727/46/20/205205
Date Deposited: 18 Apr 2023 15:09
Last Modified: 05 Apr 2024 10:54
Cite in APA 7: Capek, J., Hala, M., Zabeida, O., Sapieha, J.-E., & Martinu, L. (2013). Deposition rate enhancement in HiPIMS without compromising the ionized fraction of the deposition flux. Journal of Physics D: Applied Physics, 46(20), 10 pages. https://doi.org/10.1088/0022-3727/46/20/205205

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