Deposition rate enhancement in HiPIMS without compromising the ionized fraction of the deposition flux

J. Capek, M. Hala, O. Zabeida, Jolanta-Ewa Sapieha and Ludvik Martinu

Article (2013)

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Department:	Department of Engineering Physics
PolyPublie URL:	https://publications.polymtl.ca/14158/
Journal Title:	Journal of Physics D: Applied Physics (vol. 46, no. 20)
Publisher:	IOP Publishing
DOI:	10.1088/0022-3727/46/20/205205
Official URL:	https://doi.org/10.1088/0022-3727/46/20/205205
Date Deposited:	18 Apr 2023 15:09
Last Modified:	25 Sep 2024 15:51

Cite in APA 7:	Capek, J., Hala, M., Zabeida, O., Sapieha, J.-E., & Martinu, L. (2013). Deposition rate enhancement in HiPIMS without compromising the ionized fraction of the deposition flux. Journal of Physics D: Applied Physics, 46(20), 10 pages. https://doi.org/10.1088/0022-3727/46/20/205205
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