Documents dont le centre de recherche est "GCM - Groupe de recherche en physique et technologie des couches minces"

Article de revue

Bensaada, A., Chennouf, A., Cochrane, R. W., Graham, J. T., Leonelli, R., & Masut, R. A. (1994). Misfit strain, relaxation, and band-gap shift in GaₓIn₁₋ₓP/InP epitaxial layers. Journal of Applied Physics, 75(6), 3024-3029. Lien externe

Bensaada, A., Graham, J. T., Brebner, J. L., Chennouf, A., Cochrane, R. W., Leonelli, R., & Masut, R. A. (1994). Band alignment in GaₓIn₁₋ₓP/InP heterostructures. Applied Physics Letters, 64(3), 273-275. Lien externe

Cliche, L., Roorda, S., & Masut, R. A. (1994). Persistent room-temperature relaxation of InP amorphized and compacted by MeV ion beams. Applied Physics Letters, 65(14), 1754-1756. Lien externe

Cova, P., Masut, R. A., Tran, C. A., Bensaada, A., & Currie, J. F. (1994). Combustion of effluent gases from a metal-organic vapor phase epitaxy system. Combustion Science and Technology, 97(1-3), 1-11. Lien externe

Grimal, O., Masson, D. P., Bertrand, L., & Yelon, A. (1994). Evidence of weak phonon coupling to the Si-H stretching modes in a-Si:H. Physical review. B, Condensed matter, 49(15), 10242-10247. Lien externe

Tran, C. A., Graham, J. T., Brebner, J. L., & Masut, R. A. (1994). Interfaces of InAsP/InP multiple quantum wells grown by metalorganic vapor phase epitaxy. Journal of Electronic Materials, 23(12), 1291-1296. Lien externe

Wertheimer, M. R., & Moisan, M. (1994). Processing of electronic materials by microwave plasma. Pure and Applied Chemistry, 66(6), 1343-1352. Lien externe

Communication écrite

Martinu, L., Sapieha, J.-E., Küttel, O. M., Raveh, A., & Wertheimer, M. R. (novembre 1993). Critical ion energy and ion flux in the growth of films by plasma-enhanced chemical-vapor deposition [Communication écrite]. 40th National Symposium of the American Vacuum Society, Orlando, FL. Publié dans Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 12(4, pt. 1). Lien externe

Suys, M., Izquierdo, R., Sacher, E., & Meunier, M. (octobre 1994). Excimer laser chemical vapor deposition of copper from Cu(hfac) (TMVS) [Communication écrite]. Advanced Metallization for ULSI, Austin, Texas, USA. Non disponible

Chapitre de livre

Meunier, M., Desjardins, P., Izquierdo, R., Tabbal, M., & Suys, M. (1994). Excimer laser for in situ processing in microelectronics. Dans Laude, L. D. (édit.), Excimer lasers : The tools, fundamentals of their interactions with matter, field of applications (p. 319-338). Lien externe