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Critical ion energy and ion flux in the growth of films by plasma-enhanced chemical-vapor deposition

Ludvik Martinu, Jolanta-Ewa Sapieha, O. M. Kuttel, A. Raveh and Michael R. Wertheimer

Paper (1993)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/33035/
Conference Title: 40th National Symposium of the American Vacuum Society
Conference Location: Orlando, FL
Conference Date(s): 1993-11-15 - 1993-11-19
Journal Title: Journal of vacuum science and technology. A, Vacuum, surfaces, and films (vol. 12, no. 4, pt. 1)
Publisher: American Vacuum Society
DOI: 10.1116/1.579322
Official URL: https://doi.org/10.1116/1.579322
Date Deposited: 18 Apr 2023 15:25
Last Modified: 05 Apr 2024 11:23
Cite in APA 7: Martinu, L., Sapieha, J.-E., Kuttel, O. M., Raveh, A., & Wertheimer, M. R. (1993, November). Critical ion energy and ion flux in the growth of films by plasma-enhanced chemical-vapor deposition [Paper]. 40th National Symposium of the American Vacuum Society, Orlando, FL. Published in Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 12(4, pt. 1). https://doi.org/10.1116/1.579322

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