Documents dont le centre de recherche est "GCM - Groupe de recherche en physique et technologie des couches minces"

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Beaudoin, M., Arsenault, C. J., Izquierdo, R., & Meunier, M. (1989). Interface study of hydrogenated amorphous silicon nitride on hydrogenated amorphous silicon by X-ray photoelectron spectroscopy. Applied Physics Letters, 55(25), 2640-2640. Lien externe

Bekkay, T., Izquierdo, R., St-Denis, M., Sacher, E., & Yelon, A. (1989). The presence of silane gas in plasma-deposited hydrogenated amorphous silicon. Surface Science, 222(2-3), L831-L836. Lien externe

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Izquierdo, R., Lavoie, C., & Meunier, M. (novembre 1989). KRF excimer laser deposition of titanium from TiCl₄ [Communication écrite]. 1989 MRS Fall Meeting, Boston, Mass.. Publié dans MRS Proceedings, 158. Lien externe

Izquierdo, R., Sacher, E., & Yelon, A. (1989). X-ray photoelectron spectra of antimony oxides. Applied Surface Science, 40(1-2), 175-177. Lien externe

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Lamontagne, B., & Wertheimer, M. R. (septembre 1989). Microwave and radiofrequency O₂/CF₄ plasma etching of commercial polymers [Communication écrite]. 9th International Symposium on Plasma Chemistry (ISPC 1989), Pugnochiuso, Italy. Lien externe

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Martinu, L., Pische, V., & d'Agostino, R. (septembre 1989). Plasma-surface interactions effects in the growth of metal-filled plasma polymers [Communication écrite]. 9th International Symposium on Plasma Chemistry (ISPC 1989), Pugnochiuso, Italy. Lien externe

Martinu, L., Sapieha, J.-E., & Wertheimer, M. R. (septembre 1989). Deposition of semiconducting and dielectric films in "dual-" and "single-mode" microwave or radio frequency [Communication écrite]. 9th International Symposium on Plasma Chemistry (ISPC 1989), Pugnochiuso, Italy. Lien externe

Martinu, L., Sapieha, J.-E., & Wertheimer, M. R. (1989). Dual‐mode microwave/radio frequency plasma deposition of dielectric thin films. Applied Physics Letters, 54(26), 2645-2647. Lien externe

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Pische, V., Martinu, L., & d'Agostino, R. (septembre 1989). The effect of bias and temperature on the deposition of Au-containing plasma polymerized fluoroethane [Communication écrite]. 9th International Symposium on Plasma Chemistry (ISPC 1989), Pugnochiuso, Italy. Lien externe

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Sacher, E., Currie, J. F., & Yelon, A. (1989). Electronegativity effects in chemical sputtering. Surface Science, 220(1), L679-L686. Lien externe