 | Up a level |
Collaboration networkThis graph maps the connections between all the collaborators of {}'s publications listed on this page.
Each link represents a collaboration on the same publication. The thickness of the link represents the number of collaborations.
Use the mouse wheel or scroll gestures to zoom into the graph.
You can click on the nodes and links to highlight them and move the nodes by dragging them.
Hold down the "Ctrl" key or the "⌘" key while clicking on the nodes to open the list of this person's publications.
Word cloudA word cloud is a visual representation of the most frequently used words in a text or a set of texts. The words appear in different sizes, with the size of each word being proportional to its frequency of occurrence in the text. The more frequently a word is used, the larger it appears in the word cloud. This technique allows for a quick visualization of the most important themes and concepts in a text.
In the context of this page, the word cloud was generated from the publications of the author {}. The words in this cloud come from the titles, abstracts, and keywords of the author's articles and research papers. By analyzing this word cloud, you can get an overview of the most recurring and significant topics and research areas in the author's work.
The word cloud is a useful tool for identifying trends and main themes in a corpus of texts, thus facilitating the understanding and analysis of content in a visual and intuitive way.
Bettayeb, B., Bassetto, S., Vialletelle, P., & Tollenaere, M. (2012). Quality and exposure control in semiconductor manufacturing. Part I: Modelling. International Journal of Production Research, 50(23), 6835-6851. External link
Bettayeb, B., Bassetto, S., Vialletelle, P., & Tollenaere, M. (2012). Quality and exposure control in semiconductor manufacturing. Part II: Evaluation. International Journal of Production Research, 50(23), 6852-6869. External link
Bassetto, S., Siadat, A., & Tollenaere, M. (2011). The management of process control deployment using interactions in risks analyses. Journal of Loss Prevention in the Process Industries, 24(4), 458-465. External link
Bettayeb, B., Tollenaere, M., & Bassetto, S. (2011, October). Plan de surveillance basé sur l'exposition aux risques et les capabilités des ressources [Paper]. 9e Congrès international de génie industriel (CIGI 2011), Saint-Sauveur, Québec. Unavailable
Bettayeb, B., Vialletelle, P., Bassetto, S., & Tollenaere, M. (2010, November). Operational risk evaluation and control plan design [Paper]. 13th ARCSIS Technical & Scientific Meeting, Manufacturing Challenges in European Semiconductor Fabs, Rousset, France. Unavailable
Bettayeb, B., Vialletelle, P., Bassetto, S., & Tollenaere, M. (2010, October). Optimized design of control plans based on risk exposure and resources capabilities [Paper]. International Symposium on Semiconductor Manufacturing (ISSM 2010), Tokyo. Japan. External link
Bassetto, S., Mili, A., Siadat, A., & Tollenaere, M. (2007, June). Proposition d'organisation du retour d'expériences par la gestion des risques pour faciliter l'industrialisation [Paper]. 7e Congrès international de génie industriel (CIGI 2007), Trois-Rivières, Québec. Unavailable
Fiegenwald, V., Bassetto, S., & Tollenaere, M. (2011, December). Controlling non-conformities propagation in manufacturing. Case study in an electromechanical assembly plant [Paper]. IEEE International Conference on Industrial Engineering and Engineering Management (IEEM 2011), Singapore, Singapore. External link
Fiegenwald, V., Bassetto, S., & Tollenaere, M. (2011, October). Vers la maîtrise de la propagation des non-conformités en fabrication : cas d'étude dans une usine d'assemblage électromécanique [Paper]. 9e Congrès international de génie industriel (CIGI 2011), Saint-Sauveur, Québec. Unavailable
Mili, A., Siadat, A., Bassetto, S., Hubac, S., & Tollenaere, M. (2009, March). Unified process for action plan management: Case study in a research and production semiconductor factory [Paper]. 3rd Annual IEEE Systems Systems Conference, Vancouver, British Columbia. External link
Sahnoun, M. , Bettayeb, B., Bassetto, S., & Tollenaere, M. (2014). Simulation-based optimization of sampling plans to reduce inspections while mastering the risk exposure in semiconductor manufacturing. Journal of Intelligent Manufacturing, 27(6), 1335-1349. External link
Sahnoun, M. , Bettayeb, B., Tollenaere, M., & Bassetto, S. (2012, March). Smart sampling for risk reduction and delay optimisation [Paper]. IEEE International Systems Conference, Vancouver, BC, Canada. External link
Sahnoun, M. , Vialletelle, P., Bassetto, S., Tollenaere, M., & Bastoini, S. (2010, November). Historical wafer-at-risk construction in STMicroelectronics 300mm wafer fab in crollesoptimizing return on inspection through defectivity smart skipping [Paper]. Manufacturing Challenges in European Semiconductor Fabs, Rousset, France. Unavailable
Sahnoun, M., Vialletelle, P., Bastoini, S., Bassetto, S., & Tollenaere, M. (2010, October). Optimized return on inspection through smart-sampling [Paper]. International Symposium on Semiconductor Manufacturing (ISSM 2010), Tokyo, Japan. External link
Tadja, D. D., Bassetto, S., Tollenaere, M., & Wong, T. (2021). Les objets connectés pour améliorer la culture de la production épurée : revue de littérature et esquisse de solution applicable aux entreprises manufacturières. [Industrial Internet of Things to improve lean manufacturing culture: literature review and solution outline for manufacturing plants]. Génie industriel et productique, 4(1), 35 pages. External link
