Belgacem Bettayeb, Samuel Bassetto, Philippe Vialletelle and Michel Tollenaere
Article (2012)
An external link is available for this itemDepartment: | Department of Mathematics and Industrial Engineering |
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PolyPublie URL: | https://publications.polymtl.ca/15774/ |
Journal Title: | International Journal of Production Research (vol. 50, no. 23) |
Publisher: | Taylor & Francis |
DOI: | 10.1080/00207543.2011.630043 |
Official URL: | https://doi.org/10.1080/00207543.2011.630043 |
Date Deposited: | 18 Apr 2023 15:10 |
Last Modified: | 05 Apr 2024 10:56 |
Cite in APA 7: | Bettayeb, B., Bassetto, S., Vialletelle, P., & Tollenaere, M. (2012). Quality and exposure control in semiconductor manufacturing. Part II: Evaluation. International Journal of Production Research, 50(23), 6852-6869. https://doi.org/10.1080/00207543.2011.630043 |
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