 | Up a level |
Collaboration networkThis graph maps the connections between all the collaborators of {}'s publications listed on this page.
Each link represents a collaboration on the same publication. The thickness of the link represents the number of collaborations.
Use the mouse wheel or scroll gestures to zoom into the graph.
You can click on the nodes and links to highlight them and move the nodes by dragging them.
Hold down the "Ctrl" key or the "⌘" key while clicking on the nodes to open the list of this person's publications.
Word cloudA word cloud is a visual representation of the most frequently used words in a text or a set of texts. The words appear in different sizes, with the size of each word being proportional to its frequency of occurrence in the text. The more frequently a word is used, the larger it appears in the word cloud. This technique allows for a quick visualization of the most important themes and concepts in a text.
In the context of this page, the word cloud was generated from the publications of the author {}. The words in this cloud come from the titles, abstracts, and keywords of the author's articles and research papers. By analyzing this word cloud, you can get an overview of the most recurring and significant topics and research areas in the author's work.
The word cloud is a useful tool for identifying trends and main themes in a corpus of texts, thus facilitating the understanding and analysis of content in a visual and intuitive way.
Bettayeb, B., & Bassetto, S. (2014, March). Effects of process learning and product lifecycle on risk-based quality control plans [Paper]. 8th annual IEEE International Systems Conference on Systems Conference (SysCon 2014), Ottawa, ON. External link
Bettayeb, B., Bassetto, S., Vialletelle, P., & Tollenaere, M. (2012). Quality and exposure control in semiconductor manufacturing. Part I: Modelling. International Journal of Production Research, 50(23), 6835-6851. External link
Bettayeb, B., Bassetto, S., Vialletelle, P., & Tollenaere, M. (2012). Quality and exposure control in semiconductor manufacturing. Part II: Evaluation. International Journal of Production Research, 50(23), 6852-6869. External link
Bettayeb, B., Tollenaere, M., & Bassetto, S. (2011, October). Plan de surveillance basé sur l'exposition aux risques et les capabilités des ressources [Paper]. 9e Congrès international de génie industriel (CIGI 2011), Saint-Sauveur, Québec. Unavailable
Bettayeb, B., Vialletelle, P., Bassetto, S., & Tollenaere, M. (2010, November). Operational risk evaluation and control plan design [Paper]. 13th ARCSIS Technical & Scientific Meeting, Manufacturing Challenges in European Semiconductor Fabs, Rousset, France. Unavailable
Bettayeb, B., Vialletelle, P., Bassetto, S., & Tollenaere, M. (2010, October). Optimized design of control plans based on risk exposure and resources capabilities [Paper]. International Symposium on Semiconductor Manufacturing (ISSM 2010), Tokyo. Japan. External link
Sahnoun, M. , Bettayeb, B., Bassetto, S., & Tollenaere, M. (2014). Simulation-based optimization of sampling plans to reduce inspections while mastering the risk exposure in semiconductor manufacturing. Journal of Intelligent Manufacturing, 27(6), 1335-1349. External link
Sahnoun, M. , Bettayeb, B., Tollenaere, M., & Bassetto, S. (2012, March). Smart sampling for risk reduction and delay optimisation [Paper]. IEEE International Systems Conference, Vancouver, BC, Canada. External link
