Belgacem Bettayeb, Samuel Bassetto
, Philippe Vialletelle and Michel Tollenaere
Article (2012)
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| Department: | Department of Mathematics and Industrial Engineering |
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| PolyPublie URL: | https://publications.polymtl.ca/15773/ |
| Journal Title: | International Journal of Production Research (vol. 50, no. 23) |
| Publisher: | Taylor & Francis |
| DOI: | 10.1080/00207543.2011.630042 |
| Official URL: | https://doi.org/10.1080/00207543.2011.630042 |
| Date Deposited: | 18 Apr 2023 15:10 |
| Last Modified: | 25 Sep 2024 15:53 |
| Cite in APA 7: | Bettayeb, B., Bassetto, S., Vialletelle, P., & Tollenaere, M. (2012). Quality and exposure control in semiconductor manufacturing. Part I: Modelling. International Journal of Production Research, 50(23), 6835-6851. https://doi.org/10.1080/00207543.2011.630042 |
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