<  Retour au portail Polytechnique Montréal

Documents dont l'auteur est "Lamontagne, B."

Monter d'un niveau
Pour citer ou exporter [feed] Atom [feed] RSS 1.0 [feed] RSS 2.0
Grouper par: Auteurs ou autrices | Date de publication | Sous-type de document | Aucun groupement
Aller à : 1994 | 1993 | 1992 | 1991 | 1988 | 1987
Nombre de documents: 11

1994

Lamontagne, B., Sacher, E., & Wertheimer, M. R. (1994). The Au/Si(100) (1 × 1)-H interface, as studied by XPS and AFM: a model of the interfacial reaction. Applied Surface Science, 78(4), 399-411. Lien externe

Shi, M. K., Lamontagne, B., Selmani, A., Martinu, L., Sacher, E., Wertheimer, M. R., & Yelon, A. (1994). Metallization of Teflon PFA. I. Interactions of evaporated Cr and Al measured by X-ray photoelectron spectroscopy. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 12(1), 29-34. Lien externe

Shi, M. K., Lamontagne, B., Selmani, A., Martinu, L., Sacher, E., Wertheimer, M. R., & Yelon, A. (1994). Metallization of Teflon PFA. II. Interactions of Ti, Ag, and Au measured by X-ray photoelectron spectroscopy. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 12(3), 807-812. Lien externe

Shi, M.-K., Lamontagne, B., Selmani, A., & Martinu, L. (1994). X-ray photoelectron spectroscopy study of X-ray irradiated metal/fluoropolymer interfaces. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 12(1), 44-50. Lien externe

1993

Lamontagne, B., Sacher, E., & Wertheimer, M. R. (1993). X-ray photoelectron diffraction and spectroscopy of sputter-deposited or evaporated coinage metals on Si(100). Applied Surface Science, 64(3), 205-213. Lien externe

Shi, M. K., Lamontagne, B., Martinu, L., & Selmani, A. (1993). X-Ray-Induced Modification Of Metal Fluoropolymer Interfaces. Journal of Applied Physics, 74(3), 1744-1746. Lien externe

1992

Lamontagne, B., Sacher, E., & Wertheimer, M. R. (1992). Amorphization of c‐Si by the sputter deposition of Au studied by x‐ray photoelectron diffraction. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 10(4), 1002-1005. Lien externe

1991

Lamontagne, B., Küttel, O. M., & Wertheimer, M. R. (1991). Etching of polymers in microwave/radio-frequency O2-CF4 plasma. Canadian Journal of Physics, 69(3-4), 202-206. Lien externe

Lamontagne, B., Sacher, E., & Wertheimer, M. R. (1991). Silicon-carbon reaction provoked by the sputter cleaning of lightly contaminated crystalline silicon. Applied Surface Science, 52(1), 71-76. Lien externe

1988

Wrobel, A. M., Lamontagne, B., & Wertheimer, M. R. (1988). Large-area microwave and radiofrequency plasma etching of polymers. Plasma Chemistry and Plasma Processing, 8(3), 315-329. Lien externe

1987

Lamontagne, B., Wrobel, A. M., Jalbert, G., & Wertheimer, M. R. (1987). Large-area microwave plasma etching of polyimide. Journal of Physics D: Applied Physics, 20(7), 844-844. Lien externe

Liste produite: Sun Nov 24 04:48:55 2024 EST.