B. Lamontagne, O. M. Küttel and Michael R. Wertheimer
Article (1991)
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| Department: | Department of Engineering Physics |
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| PolyPublie URL: | https://publications.polymtl.ca/38186/ |
| Journal Title: | Canadian Journal of Physics (vol. 69, no. 3-4) |
| Publisher: | Canadian Science Publishing |
| DOI: | 10.1139/p91-033 |
| Official URL: | https://doi.org/10.1139/p91-033 |
| Date Deposited: | 18 Apr 2023 15:26 |
| Last Modified: | 25 Sep 2024 16:22 |
| Cite in APA 7: | Lamontagne, B., Küttel, O. M., & Wertheimer, M. R. (1991). Etching of polymers in microwave/radio-frequency O2-CF4 plasma. Canadian Journal of Physics, 69(3-4), 202-206. https://doi.org/10.1139/p91-033 |
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