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Documents dont l'auteur est "Hoffmann, P."

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Aller à : 2015 | 2005 | 2004 | 2003 | 2002 | 2001 | 2000
Nombre de documents: 12

2015

Doridant, A., Raoult, J., Jarrix, S., Laurin, J.-J., & Hoffmann, P. (novembre 2015). Preliminary study of Automatic Control Gain loop subjected to pulse-modulated radiofrequency interference [Communication écrite]. 10th International Workshop on the Electromagnetic Compatibility of Integrated Circuits (EMC Compo 2015), Edinburgh, Scotland. Lien externe

2005

Cicoira, F., Hoffmann, P., Olsson, C. O. A., Xanthopoulos, N., Mathieu, H. J., & Doppelt, P. (2005). Auger electron spectroscopy analysis of high metal content micro-structures grown by electron beam induced deposition. Applied Surface Science, 242(1-2), 107-113. Lien externe

Luisier, A., Utke, I., Bret, T., Cicoira, F., Hauert, R., Rhee, S. W., Doppelt, P., & Hoffmann, P. (2005). Comparative study of cu-precursors for 3D focused electron beam induced deposition. Journal of The Electrochemical Society, 152(9), C590-C593. Lien externe

2004

Cicoira, F., Leifer, K., Hoffmann, P., Utke, I., Dwir, B., Laub, D., Buffat, P. A., Kapon, E., & Doppelt, P. (2004). Electron beam induced deposition of rhodium from the precursor [RhCl(PF3)2]2: Morphology, structure and chemical composition. Journal of Crystal Growth, 265(3-4), 619-626. Lien externe

2003

Seuret, P., Cicoira, F., Ohta, T., Doppelt, P., Hoffmann, P., Weber, J., & Wesolowski, T. A. (2003). An experimental and theoretical study of [RhCl(PF3)2]2 fragmentation. Physical Chemistry Chemical Physics, 5(2), 268-274. Lien externe

Hoffmann, P., Utke, I., & Cicoira, F. (juin 2002). Limits of 3-D nanostructures fabricated by focused electron beam (FEB) induced deposition [Communication écrite]. 10th International Symposium on Nanostructures: Physics and Technology, USA. Lien externe

2002

Hoffmann, P., Utke, I., Jaenchen, G., Cicoira, F., & Rohner, J. (2002). Focused electron beam deposition of one-, two-, and three-dimensional nano-structures for biological applications. European Cells and Materials, 2(supp. 1), 91-92. Non disponible

Utke, I., Cicoira, F., Jaenchen, G., Hoffmann, P., Scandella, L., Dwir, B., Kapon, E., Laub, D., Buffat, P., Xanthopoulos, N., & Mathieu, H. J. (novembre 2001). Focused electron beam induced deposition of high resolution magnetic scanning probe tips [Communication écrite]. Making Functional Materials with Nanotubes (Symposium Z), Boston, MA, United states. Lien externe

2001

Ohta, T., Cicoira, F., Doppelt, P., Beitone, L., & Hoffmann, P. (2001). Self-reducible CuII source reagents for the CVD of copper. Chemical Vapor Deposition, 7(1), 28-31. Lien externe

Ohta, T., Cicoira, F., Doppelt, P., Beitone, L., & Hoffmann, P. (2001). Static vapor pressure measurement of low volatility precursors for molecular vapor deposition below ambient temperature. Chemical Vapor Deposition, 7(1), 33-37. Lien externe

2000

Utke, I., Dwir, B., Leifer, K., Cicoira, F., Doppelt, P., Hoffmann, P., & Kapon, E. (septembre 1999). Electron beam induced deposition of metallic tips and wires for microelectronics applications [Communication écrite]. 25th International Conference on Micro- and Nano-Engineering. Publié dans Microelectronic Engineering, 53(1-4). Lien externe

Hoffmann, P., Utke, I., Cicoira, F., Dwir, B., Leifer, K., Kapon, E., & Doppelt, P. (avril 2000). Focused electron beam induced deposition of gold and rhodium [Communication écrite]. Materials Development for Direct Write Technologies (Symposium V), Warrendale, PA, USA. Lien externe

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