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Static vapor pressure measurement of low volatility precursors for molecular vapor deposition below ambient temperature

T. Ohta, Fabio Cicoira, P. Doppelt, L. Beitone and P. Hoffmann

Article (2001)

Document published while its authors were not affiliated with Polytechnique Montréal

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PolyPublie URL: https://publications.polymtl.ca/27167/
Journal Title: Chemical Vapor Deposition (vol. 7, no. 1)
Publisher: Wiley
DOI: 10.1002/1521-3862(200101)7:1<33::aid-cvde33>3.0.co;2-y
Official URL: https://doi.org/10.1002/1521-3862%28200101%297%3a1...
Date Deposited: 18 Apr 2023 15:21
Last Modified: 05 Apr 2024 11:14
Cite in APA 7: Ohta, T., Cicoira, F., Doppelt, P., Beitone, L., & Hoffmann, P. (2001). Static vapor pressure measurement of low volatility precursors for molecular vapor deposition below ambient temperature. Chemical Vapor Deposition, 7(1), 33-37. https://doi.org/10.1002/1521-3862%28200101%297%3a1%3c33%3a%3aaid-cvde33%3e3.0.co%3b2-y

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