T. Ohta, Fabio Cicoira, P. Doppelt, L. Beitone and P. Hoffmann
Article (2001)
Document published while its authors were not affiliated with Polytechnique Montréal
An external link is available for this item| PolyPublie URL: | https://publications.polymtl.ca/27167/ |
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| Journal Title: | Chemical Vapor Deposition (vol. 7, no. 1) |
| Publisher: | Wiley |
| DOI: | 10.1002/1521-3862(200101)7:1<33::aid-cvde33>3.0.co;2-y |
| Official URL: | https://doi.org/10.1002/1521-3862%28200101%297%3a1... |
| Date Deposited: | 18 Apr 2023 15:21 |
| Last Modified: | 08 Apr 2025 02:16 |
| Cite in APA 7: | Ohta, T., Cicoira, F., Doppelt, P., Beitone, L., & Hoffmann, P. (2001). Static vapor pressure measurement of low volatility precursors for molecular vapor deposition below ambient temperature. Chemical Vapor Deposition, 7(1), 33-37. https://doi.org/10.1002/1521-3862%28200101%297%3a1%3c33%3a%3aaid-cvde33%3e3.0.co%3b2-y |
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