T. Ohta, Fabio Cicoira, P. Doppelt, L. Beitone and P. Hoffmann
Article (2001)
Document published while its authors were not affiliated with Polytechnique Montréal
An external link is available for this itemPolyPublie URL: | https://publications.polymtl.ca/27167/ |
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Journal Title: | Chemical Vapor Deposition (vol. 7, no. 1) |
Publisher: | Wiley |
DOI: | 10.1002/1521-3862(200101)7:1<33::aid-cvde33>3.0.co;2-y |
Official URL: | https://doi.org/10.1002/1521-3862%28200101%297%3a1... |
Date Deposited: | 18 Apr 2023 15:21 |
Last Modified: | 25 Sep 2024 16:07 |
Cite in APA 7: | Ohta, T., Cicoira, F., Doppelt, P., Beitone, L., & Hoffmann, P. (2001). Static vapor pressure measurement of low volatility precursors for molecular vapor deposition below ambient temperature. Chemical Vapor Deposition, 7(1), 33-37. https://doi.org/10.1002/1521-3862%28200101%297%3a1%3c33%3a%3aaid-cvde33%3e3.0.co%3b2-y |
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