T. Ohta, Fabio Cicoira
, P. Doppelt, L. Beitone and P. Hoffmann
Article (2001)
Document published while its authors were not affiliated with Polytechnique Montréal
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| PolyPublie URL: | https://publications.polymtl.ca/27168/ |
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| Journal Title: | Chemical Vapor Deposition (vol. 7, no. 1) |
| Publisher: | Wiley |
| DOI: | 10.1002/1521-3862(200101)7:1<28::aid-cvde28>3.0.co;2-6 |
| Official URL: | https://doi.org/10.1002/1521-3862%28200101%297%3a1... |
| Date Deposited: | 18 Apr 2023 15:21 |
| Last Modified: | 08 Apr 2025 02:16 |
| Cite in APA 7: | Ohta, T., Cicoira, F., Doppelt, P., Beitone, L., & Hoffmann, P. (2001). Self-reducible CuII source reagents for the CVD of copper. Chemical Vapor Deposition, 7(1), 28-31. https://doi.org/10.1002/1521-3862%28200101%297%3a1%3c28%3a%3aaid-cvde28%3e3.0.co%3b2-6 |
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