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Self-reducible CuII source reagents for the CVD of copper

T. Ohta, Fabio Cicoira, P. Doppelt, L. Beitone and P. Hoffmann

Article (2001)

Document published while its authors were not affiliated with Polytechnique Montréal

An external link is available for this item
PolyPublie URL: https://publications.polymtl.ca/27168/
Journal Title: Chemical Vapor Deposition (vol. 7, no. 1)
Publisher: Wiley
DOI: 10.1002/1521-3862(200101)7:1<28::aid-cvde28>3.0.co;2-6
Official URL: https://doi.org/10.1002/1521-3862%28200101%297%3a1...
Date Deposited: 18 Apr 2023 15:21
Last Modified: 05 Apr 2024 11:14
Cite in APA 7: Ohta, T., Cicoira, F., Doppelt, P., Beitone, L., & Hoffmann, P. (2001). Self-reducible CuII source reagents for the CVD of copper. Chemical Vapor Deposition, 7(1), 28-31. https://doi.org/10.1002/1521-3862%28200101%297%3a1%3c28%3a%3aaid-cvde28%3e3.0.co%3b2-6



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