Documents publiés en "1996"

B

Bertrand, N., Drevillon, B., Sapieha, J.-E., & Martinu, L. (janvier 1996). In situ IR ellipsometry study of the adhesion and growth of plasma deposited silica thin films on stainless steel substrates [Communication écrite]. ICMCTF"96. Publié dans Thin solid films, 290-291. Lien externe

Borges, C. F. M., Schelz, S., Martinu, L., & Moisan, M. (1996). Adhesion of CVD diamond films on silicon substrates of different crystallographic orientations. Diamond and Related Materials, 5(12), 1402-1406. Lien externe

Borges, C. F. M., Schelz, S., St Onge, L., Moisan, M., & Martinu, L. (1996). Silicon contamination of diamond films deposited on silicon substrates in fused silica based reactors. Journal of Applied Physics, 79(6), 3290-3298. Lien externe

G

Gujrathi, S. C., Poitras, D., Sapieha, J.-E., & Martinu, L. (1996). ERD-TOF characterization of silicon-compound multilayer and graded-index optical coatings. Nuclear Instruments & Methods in Physics Research. Section B, Beam Interactions With Materials and Atoms, 118(1-4), 560-565. Lien externe

M

Malek-Tabrizi, A., Najafi, S. I., & Martinu, L. (janvier 1996). Glass integrated optics symmetric and nonsymmetric Mach-Zehnder interferometer sensors [Communication écrite]. Functional Photonic and Fiber Devices, San Jose, CA, USA. Lien externe

Martinu, L. (janvier 1996). Low-pressure plasma processing for optoelectronics applications [Communication écrite]. Functional Photonic and Fiber Devices, San Jose, CA, USA. Lien externe

P

Poitras, D., Leroux, P., Sapieha, J.-E., Gujrathi, S. C., & Martinu, L. (1996). Characterization of homogeneous and inhomogeneous Si-based optical coatings deposited in dual-frequency plasma. Optical Engineering, 35(9), 2693-2699. Lien externe

Popovici, D., Sacher, E., Meunier, M., Martinu, L., Léonard, D., & Bertrand, P. (janvier 1996). Spontaneous reaction of Cu(hfac) (TMVS) vapor with DuPont teflon AF1600 [Communication écrite]. Electrochemical Society Annual Meeting. Non disponible

S

Sapieha, J.-E., Martinu, L., Wertheimer, M. R., Günther, P., Schellin, R., Thielemann, C., & Sessler, G. M. (1996). Plasma deposition of low-stress electret films for electroacoustic and solar cell applications. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 14(5), 2775-2779. Lien externe

V

Vallon, S., Brenot, R., Hofrichter, A., Drevillon, B., Gheorghiu, A., Senemaud, C., Sapieha, J.-E., Martinu, L., & Poncin-Epaillard, F. (1996). Adhesion mechanisms in silica layers on plasma-treated polymers. Part II. Polypropylene. Journal of Adhesion Science and Technology, 10(12), 1313-1332. Lien externe

Vallon, S., Drevillon, B., Poncin-Epaillard, F., Sapieha, J.-E., & Martinu, L. (1996). Argon plasma treatment of polycarbonate: In situ spectroellipsometry study and polymer characterizations. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 14(6), 3194-3201. Lien externe

Vallon, S., Hofrichter, A., Drevillon, B., Sapieha, J.-E., Martinu, L., & Poncin-Epaillard, F. (avril 1996). Improvement of the adhesion of silica layers to polypropylene induced by nitrogen plasma treatment [Communication écrite]. 23rd International Conference on Metallurgical Coatings and Thin Films (ICMCTF 1996), San Diego, CA. Publié dans Thin solid films, 290-291. Lien externe

Vallon, S., Hofrichter, A., Drevillon, B., Sapieha, J.-E., Martinu, L., Poncin-Epaillard, F., Schalchli, A., & Benattar, J. J. (septembre 1996). Adhesion improvement of silica layers on polypropylene and polycarbonate induced by plasma treatments [Communication écrite]. EURADH 1996 and Adhesion 1996, Cambridge. Non disponible

Vallon, S., Hofrichter, A., Guyot, L., Drevillon, B., Sapieha, J.-E., Martinu, L., & Poncin-Epaillard, F. (1996). Adhesion mechanisms of silica layers on plasma-treated polymers. Part I. Polycarbonate. Journal of Adhesion Science and Technology, 10(12), 1287-1311. Lien externe

W

Wertheimer, M. R., Thomas, H. R., Perri, M. J., Sapieha, J.-E., & Martinu, L. (1996). Plasmas and polymers: from laboratory to large-scale commercialization. Pure and Applied Chemistry, 68(5), 1047-1053. Lien externe