<  Retour au portail Polytechnique Montréal

Documents dont l'auteur est "Raynaud, P."

Monter d'un niveau
Pour citer ou exporter [feed] Atom [feed] RSS 1.0 [feed] RSS 2.0
Grouper par: Auteurs ou autrices | Date de publication | Sous-type de document | Aucun groupement
Aller à : D | M | R
Nombre de documents: 5

D

Dennler, G., Houdayer, A., Raynaud, P., Séguy, I., Ségui, Y., & Wertheimer, M. R. (2003). Growth Modes of Sioₓ Films Deposited by Evaporation and Plasma-Enhanced Chemical Vapor Deposition on Polymeric Substrates. Plasmas and Polymers, 8(1), 43-59. Lien externe

Dennler, G., Houdayer, A., Raynaud, P., Séguy, I., Ségui, Y., & Wertheimer, M. R. (2003). Investigations of SiOₓ-Polymer "Interphases" by Glancing Angle Rbs With Li⁺ and Be⁺ Ions. Nuclear Instruments & Methods in Physics Research. Section B, Beam Interactions With Materials and Atoms, 208, 176-180. Lien externe

Dennler, G., Houdayer, A., Raynaud, P., Ségui, Y., & Wertheimer, M. R. (2002). Characterization by RbS of Hyper-Thin SiO₂ Layers on Various Polymers. Nuclear Instruments & Methods in Physics Research. Section B, Beam Interactions With Materials and Atoms, 192(4), 420-428. Lien externe

M

Mackova, A., Perina, V., Hnatowicz, V., Supiot, P., Vivien, C., Bousquet, A., Granier, A., Boufayed, F., Escaich, D., Raynaud, P., Segui, Y., Dennler, G., Wertheimer, M. R., Stryhal, Z., & Pavlik, J. (juin 2003). Compared properties of Organosilicon films induced by RF and Microwave organosilicon/O₂ plasmas and afterglows [Communication écrite]. 16th International Symposium on Plasma Chemistry (ISPC 2003), Taormina, Italy (5 pages). Lien externe

R

Raynaud, P., Orban, D., & Bigeon, J. (2023). Partially-separable loss to parallellize partitioned neural network training. (Rapport technique n° G-2023-36). Lien externe

Liste produite: Fri Dec 5 03:39:58 2025 EST.