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Compared properties of Organosilicon films induced by RF and Microwave organosilicon/O₂ plasmas and afterglows

A. Mackova, V. Perina, V. Hnatowicz, P. Supiot, C. Vivien, A. Bousquet, A. Granier, F. Boufayed, D. Escaich, P. Raynaud, Y. Segui, Gilles Dennler, Michael R. Wertheimer, Z. Stryhal and J. Pavlik

Paper (2003)

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Department: Department of Engineering Physics
Research Center: GCM - Thin Film Physics and Technology Research Group
PolyPublie URL: https://publications.polymtl.ca/66746/
Conference Title: 16th International Symposium on Plasma Chemistry (ISPC 2003)
Conference Location: Taormina, Italy
Conference Date(s): 2003-06-22 - 2003-06-27
Official URL: https://www.ispc-conference.org/ispcdocs/ispc16/co...
Date Deposited: 24 Jul 2025 13:24
Last Modified: 24 Jul 2025 13:24
Cite in APA 7: Mackova, A., Perina, V., Hnatowicz, V., Supiot, P., Vivien, C., Bousquet, A., Granier, A., Boufayed, F., Escaich, D., Raynaud, P., Segui, Y., Dennler, G., Wertheimer, M. R., Stryhal, Z., & Pavlik, J. (2003, June). Compared properties of Organosilicon films induced by RF and Microwave organosilicon/O₂ plasmas and afterglows [Paper]. 16th International Symposium on Plasma Chemistry (ISPC 2003), Taormina, Italy (5 pages). https://www.ispc-conference.org/ispcdocs/ispc16/complete/ISPC16_400_599.pdf#page=246

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