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Growth Modes of Sioₓ Films Deposited by Evaporation and Plasma-Enhanced Chemical Vapor Deposition on Polymeric Substrates

G. Dennler, A. Houdayer, P. Raynaud, I. Séguy, Y. Ségui and Michael R. Wertheimer

Article (2003)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/25962/
Journal Title: Plasmas and Polymers (vol. 8, no. 1)
Publisher: Kluwer Academic Publishers
DOI: 10.1023/a:1022865825205
Official URL: https://doi.org/10.1023/a%3a1022865825205
Date Deposited: 18 Apr 2023 15:19
Last Modified: 22 May 2024 13:59
Cite in APA 7: Dennler, G., Houdayer, A., Raynaud, P., Séguy, I., Ségui, Y., & Wertheimer, M. R. (2003). Growth Modes of Sioₓ Films Deposited by Evaporation and Plasma-Enhanced Chemical Vapor Deposition on Polymeric Substrates. Plasmas and Polymers, 8(1), 43-59. https://doi.org/10.1023/a%3a1022865825205

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