G. Dennler, A. Houdayer, P. Raynaud, I. Séguy, Y. Ségui and Michael R. Wertheimer
Article (2003)
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| Department: | Department of Engineering Physics |
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| PolyPublie URL: | https://publications.polymtl.ca/25962/ |
| Journal Title: | Plasmas and Polymers (vol. 8, no. 1) |
| Publisher: | Kluwer Academic Publishers |
| DOI: | 10.1023/a:1022865825205 |
| Official URL: | https://doi.org/10.1023/a%3a1022865825205 |
| Date Deposited: | 18 Apr 2023 15:19 |
| Last Modified: | 25 Sep 2024 16:06 |
| Cite in APA 7: | Dennler, G., Houdayer, A., Raynaud, P., Séguy, I., Ségui, Y., & Wertheimer, M. R. (2003). Growth Modes of Sioₓ Films Deposited by Evaporation and Plasma-Enhanced Chemical Vapor Deposition on Polymeric Substrates. Plasmas and Polymers, 8(1), 43-59. https://doi.org/10.1023/a%3a1022865825205 |
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