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Anders, A., Capek, J., Hala, M., & Martinu, L. (2012). The 'Recycling Trap': a Generalized Explanation of Discharge Runaway in High-Power Impulse Magnetron Sputtering. Journal of Physics D: Applied Physics, 45(1), 5-5. Lien externe
Capek, J., Hala, M., Zabeida, O., Sapieha, J.-E., & Martinu, L. (2013). Deposition rate enhancement in HiPIMS without compromising the ionized fraction of the deposition flux. Journal of Physics D: Applied Physics, 46(20), 10 pages. Lien externe
Capek, J., Hala, M., Zabeida, O., Sapieha, J.-E., & Martinu, L. (2012). Steady State Discharge Optimization in High-Power Impulse Magnetron Sputtering Through the Control of the Magnetic Field. Journal of Applied Physics, 111(2), 9 pages. Lien externe
Hala, M., Capek, J., Zabeida, O., Sapieha, J.-E., & Martinu, L. (2012). Hysteresis-Free Deposition of Niobium Oxide Films by Hipims Using Different Pulse Management Strategies. Journal of Physics D: Applied Physics, 45(5). Lien externe
Hala, M., Capek, J., Zabeida, O., Sapieha, J.-E., & Martinu, L. (2012). Pulse Management in High Power Pulsed Magnetron Sputtering of Niobium. Surface and Coatings Technology, 206(19-20), 4186-4193. Lien externe
