<  Back to the Polytechnique Montréal portal

Spatial Characterization of Process Variations Via Mos Transistor Time Constants in Vlsi and Wsi

M. Nekili, Yvon Savaria and Guy Bois

Article (1999)

An external link is available for this item
Additional Information: Nom historique du département: Département de génie électrique et de génie informatique
Department: Department of Electrical Engineering
Department of Computer Engineering and Software Engineering
PolyPublie URL: https://publications.polymtl.ca/28726/
Journal Title: IEEE Journal of Solid-State Circuits (vol. 34, no. 1)
Publisher: IEEE
DOI: 10.1109/4.736658
Official URL: https://doi.org/10.1109/4.736658
Date Deposited: 18 Apr 2023 15:22
Last Modified: 18 Apr 2023 15:22
Cite in APA 7: Nekili, M., Savaria, Y., & Bois, G. (1999). Spatial Characterization of Process Variations Via Mos Transistor Time Constants in Vlsi and Wsi. IEEE Journal of Solid-State Circuits, 34(1), 80-84. https://doi.org/10.1109/4.736658

Statistics

Dimensions

Repository Staff Only

View Item View Item