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Spatial Characterization of Process Variations Via Mos Transistor Time Constants in Vlsi and Wsi

Mohamed Nekili, Yvon Savaria and Guy Bois

Article (1999)

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Additional Information: Nom historique du département: Département de génie électrique et de génie informatique
Department: Department of Electrical Engineering
Department of Computer Engineering and Software Engineering
PolyPublie URL: https://publications.polymtl.ca/28726/
Journal Title: IEEE Journal of Solid-State Circuits (vol. 34, no. 1)
Publisher: IEEE
DOI: 10.1109/4.736658
Official URL: https://doi.org/10.1109/4.736658
Date Deposited: 18 Apr 2023 15:22
Last Modified: 25 Sep 2024 16:09
Cite in APA 7: Nekili, M., Savaria, Y., & Bois, G. (1999). Spatial Characterization of Process Variations Via Mos Transistor Time Constants in Vlsi and Wsi. IEEE Journal of Solid-State Circuits, 34(1), 80-84. https://doi.org/10.1109/4.736658

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