Pierre Turcotte-Tremblay, Matthieu Guihard, Simon Gaudet, Martin Chicoine, Christian Lavoie, Patrick Desjardins and François Schiettekatte
Article (2013)
An external link is available for this item| Department: | Department of Engineering Physics |
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| Research Center: | RQMP - Regroupement québécois sur les matériaux de pointe |
| PolyPublie URL: | https://publications.polymtl.ca/13002/ |
| Journal Title: | Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena (vol. 31, no. 5) |
| Publisher: | American Vacuum Society |
| DOI: | 10.1116/1.4821550 |
| Official URL: | https://doi.org/10.1116/1.4821550 |
| Date Deposited: | 18 Apr 2023 15:10 |
| Last Modified: | 25 Apr 2025 16:55 |
| Cite in APA 7: | Turcotte-Tremblay, P., Guihard, M., Gaudet, S., Chicoine, M., Lavoie, C., Desjardins, P., & Schiettekatte, F. (2013). Thin film Ni-Si solid-state reactions: Phase formation sequence on amorphized Si. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 31(5). https://doi.org/10.1116/1.4821550 |
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