 | Monter d'un niveau |
Béland, L. K., Anahory, Y., Smeets, D., Guihard, M., Brommer, P., Joly, J.-F., Pothier, J.-C., Lewis, L. J., Mousseau, N., & Schiettekatte, F. (2013). Replenish and Relax: Explaining Logarithmic Annealing in Ion-Implanted c-Si. Physical Review Letters, 111(10), 105502 (5 pages). Lien externe
Turcotte-Tremblay, P., Guihard, M., Gaudet, S., Chicoine, M., Lavoie, C., Desjardins, P., & Schiettekatte, F. (2013). Thin film Ni-Si solid-state reactions: Phase formation sequence on amorphized Si. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 31(5). Lien externe
