Documents publiés en "2006"

A

Amassian, A., Desjardins, P., & Martinu, L. (2006). Ion-surface interactions on c-Si(001) at the radiofrequency-powered electrode in low-pressure plasmas: ex situ spectroscopic ellipsometry and Monte Carlo simulation study. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 24(1), 45-54. Lien externe

Amassian, A., Gaidi, M., Chaker, M., & Martinu, L. (2006). Optical depth profiling of strontium titanate and electro-optic lanthanum-modified lead zirconium titanate multilayer structures for active waveguide applications. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 24(1), 55-64. Lien externe

Amassian, A., Svec, M., Desjardins, P., & Martinu, L. (2006). Dynamics of ion bombardment-induced modifications of Si(001) at the radio-frequency-biased electrode in low-pressure oxygen plasmas: in situ spectroscopic ellipsometry and Monte Carlo study. Journal of Applied Physics, 100(6), 063526. Lien externe

Amassian, A., Svec, M., Desjardins, P., & Martinu, L. (2006). Interface broadening due to ion mixing during thin film growth at the radio-frequency-biased electrode in a plasma-enhanced chemical vapor deposition environment. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 24(6), 2061-2069. Lien externe

J

Jedrzejowski, P., Amassian, A., Bousser, E., Sapieha, J.-E., & Martinu, L. (2006). Real-time in situ growth study of TiN- and TiCₓNy-based superhard nanocomposite coatings using spectroscopic ellipsometry. Applied Physics Letters, 88(7), 71915-1. Lien externe

M

Martinu, L., Masse, J.-P., Szymanowski, H., Zabeida, O., Amassian, A., & Sapieha, J.-E. (2006). Stability and effect of annealing on the optical properties of plasma-deposited Ta₂O₅ and Nb₂O₅ films. Thin Solid Films, 515(4), 1674-1682. Lien externe

V

Vernhes, R., Amassian, A., Sapieha, J.-E., & Martinu, L. (2006). Plasma treatment of porous SiNₓ:H films for the fabrication of porous-dense multilayer optical filters with tailored interfaces. Journal of Applied Physics, 99(11), 114315.1-114315.12-114315.1-114315.12. Lien externe