Interface broadening due to ion mixing during thin film growth at the radio-frequency-biased electrode in a plasma-enhanced chemical vapor deposition environment

A. Amassian, Martin Švec, Patrick Desjardins and Ludvik Martinu

Article (2006)

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Department:	Department of Engineering Physics
Research Center:	RQMP - Regroupement québécois sur les matériaux de pointe
PolyPublie URL:	https://publications.polymtl.ca/23452/
Journal Title:	Journal of vacuum science and technology. A, Vacuum, surfaces, and films (vol. 24, no. 6)
Publisher:	American Vacuum Society
DOI:	10.1116/1.2348642
Official URL:	https://doi.org/10.1116/1.2348642
Date Deposited:	18 Apr 2023 15:17
Last Modified:	08 Apr 2025 02:11

Cite in APA 7:	Amassian, A., Švec, M., Desjardins, P., & Martinu, L. (2006). Interface broadening due to ion mixing during thin film growth at the radio-frequency-biased electrode in a plasma-enhanced chemical vapor deposition environment. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 24(6), 2061-2069. https://doi.org/10.1116/1.2348642
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