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Interface broadening due to ion mixing during thin film growth at the radio-frequency-biased electrode in a plasma-enhanced chemical vapor deposition environment

A. Amassian, M. Svec, Patrick Desjardins and Ludvik Martinu

Article (2006)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/23452/
Journal Title: Journal of vacuum science and technology. A, Vacuum, surfaces, and films (vol. 24, no. 6)
Publisher: American Vacuum Society
DOI: 10.1116/1.2348642
Official URL: https://doi.org/10.1116/1.2348642
Date Deposited: 18 Apr 2023 15:17
Last Modified: 05 Apr 2024 11:08
Cite in APA 7: Amassian, A., Svec, M., Desjardins, P., & Martinu, L. (2006). Interface broadening due to ion mixing during thin film growth at the radio-frequency-biased electrode in a plasma-enhanced chemical vapor deposition environment. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 24(6), 2061-2069. https://doi.org/10.1116/1.2348642

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