Interface broadening due to ion mixing during thin film growth at the radio-frequency-biased electrode in a plasma-enhanced chemical vapor deposition environment

A. Amassian, M. Svec, Patrick Desjardins and Ludvik Martinu

Article (2006)

An external link is available for this item

Department:	Department of Engineering Physics
Research Center:	RQMP - Regroupement québécois sur les matériaux de pointe
PolyPublie URL:	https://publications.polymtl.ca/23452/
Journal Title:	Journal of vacuum science and technology. A, Vacuum, surfaces, and films (vol. 24, no. 6)
Publisher:	American Vacuum Society
DOI:	10.1116/1.2348642
Official URL:	https://doi.org/10.1116/1.2348642
Date Deposited:	18 Apr 2023 15:17
Last Modified:	27 Sep 2024 13:56

Cite in APA 7:	Amassian, A., Svec, M., Desjardins, P., & Martinu, L. (2006). Interface broadening due to ion mixing during thin film growth at the radio-frequency-biased electrode in a plasma-enhanced chemical vapor deposition environment. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 24(6), 2061-2069. https://doi.org/10.1116/1.2348642
APA 7 (HTML)ASCII CitationAtomBibTeXDOIsDublin CoreEndNote (.ENW)MARC (ISO 2709/UTF-8) (.MRC)MARC (UTF-8) (.MRK8)MARC XMLMPEG-21 DIDLMultiline CSVOAI-ORE Resource Map (Atom Format)OPENAIREOpenURL ContextObjectOpenURL ContextObject in SpanRDF+N-TriplesRDF+N3RDF+XMLReferReference Manager (.RIS)Répertoire des publications (EndNote)Simple Metadata

Statistics

Dimensions

Repository Staff Only

View Item