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Collaboration networkThis graph maps the connections between all the collaborators of {}'s publications listed on this page.
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Word cloudA word cloud is a visual representation of the most frequently used words in a text or a set of texts. The words appear in different sizes, with the size of each word being proportional to its frequency of occurrence in the text. The more frequently a word is used, the larger it appears in the word cloud. This technique allows for a quick visualization of the most important themes and concepts in a text.
In the context of this page, the word cloud was generated from the publications of the author {}. The words in this cloud come from the titles, abstracts, and keywords of the author's articles and research papers. By analyzing this word cloud, you can get an overview of the most recurring and significant topics and research areas in the author's work.
The word cloud is a useful tool for identifying trends and main themes in a corpus of texts, thus facilitating the understanding and analysis of content in a visual and intuitive way.
Vlček, J., Rusnak, K., Hajek, V., & Martinu, L. (2000). New Approach to Understanding the Reactive Magnetron Sputtering of Hard Carbon Nitride Films. Diamond and Related Materials, 9(3-6), 582-586. External link
Hajek, V., Rusnak, K., Vlček, J., Martinu, L., & Gujrathi, S. C. (1999). Influence of substrate bias voltage on the properties of CNₓ films prepared by reactive magnetron sputtering. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 17(3), 899-908. External link
Rats, D., Hajek, V., & Martinu, L. (1999). Micro-Scratch Analysis and Mechanical Properties of Plasma- Deposited Silicon-Based Coatings on Polymer Substrates. Thin Solid Films, 340(1-2), 33-39. External link
Hajek, V., Rusnak, K., Vlček, J., Martinu, L., & Hawthorne, H. M. (1997). Tribological study of CNₓ films prepared by reactive d.c. magnetron sputtering. Wear, 213(1-2), 80-89. External link
Vlcek, J., Rusnak, K., Hajek, V., & Martinu, L. (2000, March). Characterization of ion bombardment and optical emission spectroscopy in magnetron discharges for reactive sputtering of hard carbon nitride films [Abstract]. International Symposium on Trends and Applications of Thin Films (TATF 2000), Nancy, France. Published in Vide, 54(295 SUP1/4). Unavailable
