Jiří Kohout, Étienne Bousser, Thomas Schmitt, Richard Vernhes, Oleg Zabeida, Jolanta-Ewa Sapieha and Ludvik Martinu
Article (2016)
An external link is available for this itemDepartment: | Department of Engineering Physics |
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Research Center: | GCM - Thin Film Physics and Technology Research Group |
PolyPublie URL: | https://publications.polymtl.ca/35290/ |
Journal Title: | Vacuum (vol. 124) |
Publisher: | Elsevier |
DOI: | 10.1016/j.vacuum.2015.11.017 |
Official URL: | https://doi.org/10.1016/j.vacuum.2015.11.017 |
Date Deposited: | 18 Apr 2023 15:05 |
Last Modified: | 25 Sep 2024 16:18 |
Cite in APA 7: | Kohout, J., Bousser, É., Schmitt, T., Vernhes, R., Zabeida, O., Sapieha, J.-E., & Martinu, L. (2016). Stable reactive deposition of amorphous Al₂O₃ films with low residual stress and enhanced toughness using pulsed dc magnetron sputtering with very low duty cycle. Vacuum, 124, 96-100. https://doi.org/10.1016/j.vacuum.2015.11.017 |
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