Stable reactive deposition of amorphous Al₂O₃ films with low residual stress and enhanced toughness using pulsed dc magnetron sputtering with very low duty cycle

Jiří Kohout, Étienne Bousser, Thomas Schmitt, Richard Vernhes, Oleg Zabeida, Jolanta-Ewa Sapieha and Ludvik Martinu

Article (2016)

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Department:	Department of Engineering Physics
Research Center:	GCM - Thin Film Physics and Technology Research Group
PolyPublie URL:	https://publications.polymtl.ca/35290/
Journal Title:	Vacuum (vol. 124)
Publisher:	Elsevier
DOI:	10.1016/j.vacuum.2015.11.017
Official URL:	https://doi.org/10.1016/j.vacuum.2015.11.017
Date Deposited:	18 Apr 2023 15:05
Last Modified:	05 May 2023 15:40

Cite in APA 7:	Kohout, J., Bousser, É., Schmitt, T., Vernhes, R., Zabeida, O., Sapieha, J.-E., & Martinu, L. (2016). Stable reactive deposition of amorphous Al₂O₃ films with low residual stress and enhanced toughness using pulsed dc magnetron sputtering with very low duty cycle. Vacuum, 124, 96-100. https://doi.org/10.1016/j.vacuum.2015.11.017
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