<  Back to the Polytechnique Montréal portal

Pathways for hydrogen desorption from Si₁₋ₓGeₓ(001) during gas-source molecular-beam epitaxy and ultrahigh-vacuum chemical vapor deposition

H. Kim, Patrick Desjardins, J. R. Abelson and J. E. Greene

Article (1998)

An external link is available for this item
Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/29571/
Journal Title: Physical review. B, Condensed matter (vol. 58, no. 8)
Publisher: American Physical Society
DOI: 10.1103/physrevb.58.4803
Official URL: https://doi.org/10.1103/physrevb.58.4803
Date Deposited: 18 Apr 2023 15:23
Last Modified: 05 Apr 2024 11:18
Cite in APA 7: Kim, H., Desjardins, P., Abelson, J. R., & Greene, J. E. (1998). Pathways for hydrogen desorption from Si₁₋ₓGeₓ(001) during gas-source molecular-beam epitaxy and ultrahigh-vacuum chemical vapor deposition. Physical review. B, Condensed matter, 58(8), 4803-4808. https://doi.org/10.1103/physrevb.58.4803

Statistics

Dimensions

Repository Staff Only

View Item View Item