Synchrotron x-ray diffraction and transmission electon microscopy studies of interfacial reaction paths and kinetics annealing of fully-002-textured Al/TiN bilayers

J.-S. Chun, J. R. A. Carlsson, Patrick Desjardins , D. B. Bergstrom, I. Petrov, J. E. Greene, C. Lavoie et C. , jr. Cabral

Article de revue (2001)

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Département:	Département de génie physique
URL de PolyPublie:	https://publications.polymtl.ca/27503/
Titre de la revue:	Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena (vol. 19, no 1)
Maison d'édition:	American Vacuum Society
DOI:	10.1116/1.1322648
URL officielle:	https://doi.org/10.1116/1.1322648
Date du dépôt:	18 avr. 2023 15:21
Dernière modification:	05 avr. 2024 11:15

Citer en APA 7:	Chun, J.-S., Carlsson, J. R. A., Desjardins, P., Bergstrom, D. B., Petrov, I., Greene, J. E., Lavoie, C., & Cabral, C. (2001). Synchrotron x-ray diffraction and transmission electon microscopy studies of interfacial reaction paths and kinetics annealing of fully-002-textured Al/TiN bilayers. Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 19(1), 182-191. https://doi.org/10.1116/1.1322648

Citer en APA 7:

Chun, J.-S., Carlsson, J. R. A., Desjardins, P., Bergstrom, D. B., Petrov, I., Greene, J. E., Lavoie, C., & Cabral, C. (2001). Synchrotron x-ray diffraction and transmission electon microscopy studies of interfacial reaction paths and kinetics annealing of fully-002-textured Al/TiN bilayers. Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 19(1), 182-191. https://doi.org/10.1116/1.1322648

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