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Interface engineering during plasma-enhances chemical vapor deposition of porous/dense SiN1.3 optical multilayers

A. Amassian, R. Verhnes, Jolanta-Ewa Sapieha, Patrick Desjardins and Ludvik Martinu

Article (2004)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/25350/
Journal Title: Thin Solid Films (vol. 469-470)
Publisher: Elsevier
DOI: 10.1016/j.tsf.2004.07.072
Official URL: https://doi.org/10.1016/j.tsf.2004.07.072
Date Deposited: 18 Apr 2023 15:19
Last Modified: 05 Apr 2024 11:11
Cite in APA 7: Amassian, A., Verhnes, R., Sapieha, J.-E., Desjardins, P., & Martinu, L. (2004). Interface engineering during plasma-enhances chemical vapor deposition of porous/dense SiN1.3 optical multilayers. Thin Solid Films, 469-470, 47-53. https://doi.org/10.1016/j.tsf.2004.07.072

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