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Dennler, G., Houdayer, A., Raynaud, P., Séguy, I., Ségui, Y., & Wertheimer, M. R. (2003). Growth Modes of Sioₓ Films Deposited by Evaporation and Plasma-Enhanced Chemical Vapor Deposition on Polymeric Substrates. Plasmas and Polymers, 8(1), 43-59. Lien externe
Dennler, G., Houdayer, A., Raynaud, P., Séguy, I., Ségui, Y., & Wertheimer, M. R. (2003). Investigations of SiOₓ-Polymer "Interphases" by Glancing Angle Rbs With Li⁺ and Be⁺ Ions. Nuclear Instruments & Methods in Physics Research. Section B, Beam Interactions With Materials and Atoms, 208, 176-180. Lien externe
Mackova, A., Perina, V., Hnatowicz, V., Supiot, P., Vivien, C., Bousquet, A., Granier, A., Boufayed, F., Escaich, D., Raynaud, P., Segui, Y., Dennler, G., Wertheimer, M. R., Stryhal, Z., & Pavlik, J. (juin 2003). Compared properties of Organosilicon films induced by RF and Microwave organosilicon/O₂ plasmas and afterglows [Communication écrite]. 16th International Symposium on Plasma Chemistry (ISPC 2003), Taormina, Italy (5 pages). Lien externe
