Documents publiés en "1985"

B

Brebner, J. L., Cochrane, R. W., Groleau, R., Gujrathi, S., Kéroack, D., Lépine, Y., Martin, J.-P., Vanaček, M., Aktik, C., Aktik, M., Azelmad, A., Currie, J. F., Poulin-Dandurand, S., Ranchoux, B., Sacher, E., Tannous, C., Wertheimer, M. R., & Yelon, A. (1985). Progress in amorphous-silicon photovoltaic-device research. Canadian Journal of Physics, 63(6), 786-797. Lien externe

P

Paquin, L., Masson, D., Wertheimer, M. R., & Moisan, M. (1985). Amorphous silicon for photovoltaics produced by new microwave plasma-deposition techniques. Canadian Journal of Physics, 63(6), 831-837. Lien externe

R

Ramu, T. S., Wertheimer, M. R., & Sapieha, J.-E. (octobre 1985). Dielectric properties of plasma-deposited thin films: A comparison of different materials [Communication écrite]. Conference on Electrical Insulation & Dielectric Phenomena, Amherst, NY, USA. Lien externe

W

Wertheimer, M. R., & Moisan, M. (1985). Comparison of microwave and lower frequency plasmas for thin film deposition and etching. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 3(6), 2643-2649. Lien externe