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Documents publiés en "1985"

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Nombre de documents: 4

Département de génie physique

Brebner, J. L., Cochrane, R. W., Groleau, R., Gujrathi, S., Kéroack, D., Lépine, Y., Martín, J. P., Vanaček, M., Aktik, Ç., Aktik, M., Azelmad, A., Currie, J. F., Poulin-Dandurand, S., Ranchoux, B., Sacher, E., Tannous, C., Wertheimer, M. R., & Yelon, A. (1985). Progress in amorphous-silicon photovoltaic-device research. Canadian Journal of Physics, 63(6), 786-797. Lien externe

Paquin, L., Masson, D., Wertheimer, M. R., & Moisan, M. (1985). Amorphous silicon for photovoltaics produced by new microwave plasma-deposition techniques. Canadian Journal of Physics, 63(6), 831-837. Lien externe

Ramu, T. S., Wertheimer, M. R., & Sapieha, J.-E. (octobre 1985). Dielectric properties of plasma-deposited thin films: A comparison of different materials [Communication écrite]. Conference on Electrical Insulation & Dielectric Phenomena, Amherst, NY, USA. Lien externe

Wertheimer, M. R., & Moisan, M. (1985). Comparison of microwave and lower frequency plasmas for thin film deposition and etching. Journal of vacuum science and technology. A, Vacuum, surfaces, and films, 3(6), 2643-2649. Lien externe

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