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Characterization of microstructure and dopant distribution of laser diffused resistors

Yougui Liao

PhD thesis (2005)

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Cite this document: Liao, Y. (2005). Characterization of microstructure and dopant distribution of laser diffused resistors (PhD thesis, École Polytechnique de Montréal). Retrieved from https://publications.polymtl.ca/8187/
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Laser fine tuning technology -- Laser induced silicon melting and its application to microelectronics -- Laser induced heating of materials -- Laser induce silicon melting -- Laser fine tuning -- Overview of analytical techniques for dopant evaluation and structural characterization -- Dopant and impurity evaluation -- 2-D Dopant determination in laser diffused Si resistors using dopant-selective etching -- Experimental details and procedure -- Dopant profiling of LDRs -- Laser induced formation of periodic nanostructures in silicon covered by SIOb2s -- Array of periodic submicron conductive links in Si covered by SIOb2s formed by polarized laser irradiation -- Structural characterization of laser diffused resistors -- Fabrication of LDRs -- Point defect formation in LDRs -- Material interdiffusion between liquid Si and dielectric -- Dislocations -- Mass transport due to liquid convection.

Uncontrolled Keywords

Résistances électriques -- Conception et construction; Microstructure (Physique); Lasers dans l'industrie des semi-conducteurs

Open Access document in PolyPublie
Additional Information: Le fichier PDF de ce document a été produit par Bibliothèque et Archives Canada selon les termes du programme Thèses Canada https://canada.on.worldcat.org/oclc/637426693
Department: Département de génie physique
Date Deposited: 04 Aug 2021 11:05
Last Modified: 25 Aug 2021 14:58
PolyPublie URL: https://publications.polymtl.ca/8187/


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