Yougui Liao
PhD thesis (2005)
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Published Version Terms of Use: All rights reserved. Download (10MB) |
Cite this document: | Liao, Y. (2005). Characterization of microstructure and dopant distribution of laser diffused resistors (PhD thesis, École Polytechnique de Montréal). Retrieved from https://publications.polymtl.ca/8187/ |
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Abstract
Laser fine tuning technology -- Laser induced silicon melting and its application to microelectronics -- Laser induced heating of materials -- Laser induce silicon melting -- Laser fine tuning -- Overview of analytical techniques for dopant evaluation and structural characterization -- Dopant and impurity evaluation -- 2-D Dopant determination in laser diffused Si resistors using dopant-selective etching -- Experimental details and procedure -- Dopant profiling of LDRs -- Laser induced formation of periodic nanostructures in silicon covered by SIOb2s -- Array of periodic submicron conductive links in Si covered by SIOb2s formed by polarized laser irradiation -- Structural characterization of laser diffused resistors -- Fabrication of LDRs -- Point defect formation in LDRs -- Material interdiffusion between liquid Si and dielectric -- Dislocations -- Mass transport due to liquid convection.
Uncontrolled Keywords
Résistances électriques -- Conception et construction; Microstructure (Physique); Lasers dans l'industrie des semi-conducteurs
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Additional Information: | Le fichier PDF de ce document a été produit par Bibliothèque et Archives Canada selon les termes du programme Thèses Canada https://canada.on.worldcat.org/oclc/637426693 |
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Department: | Département de génie physique |
Date Deposited: | 04 Aug 2021 11:05 |
Last Modified: | 25 Aug 2021 14:58 |
PolyPublie URL: | https://publications.polymtl.ca/8187/ |
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