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GeSn: Insights from Nanoscale Materials and Devices

Lu Luo, David Vlassov, M. R. M. Atalla, Simone Assali, Cédric Lemieux-Leduc, Ziqiang Cai, Sebastian Koelling, Gérard Tanguy Eric Gnato Daligou and Oussama Moutanabbir

Paper (2025)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/72417/
Conference Title: 10th International Symposium on Control of Semiconductor Interfaces (ISCSI-X), the International Conference on Silicon Epitaxy and International SiGe Technology and Device Meeting (ICSI/ISTDM 2025)
Conference Location: Yokohama-shi, Kanagawa, Japan
Conference Date(s): 2025-11-10 - 2025-11-13
Date Deposited: 10 Feb 2026 08:56
Last Modified: 10 Feb 2026 09:13
Cite in APA 7: Luo, L., Vlassov, D., Atalla, M. R. M., Assali, S., Lemieux-Leduc, C., Cai, Z., Koelling, S., Daligou, G. T. E. G., & Moutanabbir, O. (2025, November). GeSn: Insights from Nanoscale Materials and Devices [Paper]. 10th International Symposium on Control of Semiconductor Interfaces (ISCSI-X), the International Conference on Silicon Epitaxy and International SiGe Technology and Device Meeting (ICSI/ISTDM 2025), Yokohama-shi, Kanagawa, Japan.

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