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Characterization of a two-dimensional hole gas in a GeSn quantum well system

Prateek Kaul, Jan Karthein, Jonas Buchhorn, Taizo Kawano, Taisei Usubuchi, Jun Ishihara, Nicolas Rotaru, Patrick Del Vecchio, Omar Concepción Díaz, Detlev Grützmacher, Qing-Tai Zhao, Oussama Moutanabbir, Makoto Kohda, Thomas Schäpers and Dan Mihai Buca

Paper (2025)

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Department: Department of Engineering Physics
PolyPublie URL: https://publications.polymtl.ca/72412/
Conference Title: 10th International Symposium on Control of Semiconductor Interfaces (ISCSI-X), the International Conference on Silicon Epitaxy and International SiGe Technology and Device Meeting (ICSI/ISTDM 2025)
Conference Location: Yokohama-shi, Kanagawa, Japan
Conference Date(s): 2025-11-10 - 2025-11-13
Date Deposited: 10 Feb 2026 09:10
Last Modified: 10 Feb 2026 09:13
Cite in APA 7: Kaul, P., Karthein, J., Buchhorn, J., Kawano, T., Usubuchi, T., Ishihara, J., Rotaru, N., Del Vecchio, P., Concepción Díaz, O., Grützmacher, D., Zhao, Q.-T., Moutanabbir, O., Kohda, M., Schäpers, T., & Buca, D. M. (2025, November). Characterization of a two-dimensional hole gas in a GeSn quantum well system [Paper]. 10th International Symposium on Control of Semiconductor Interfaces (ISCSI-X), the International Conference on Silicon Epitaxy and International SiGe Technology and Device Meeting (ICSI/ISTDM 2025), Yokohama-shi, Kanagawa, Japan.

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