Residual stress depth profiles self-developed in cathodic arc deposited Ti-Al-N coatings prepared at different constant substrate bias values

L. B. Varela, P. R. T. Avila, A. Miletić, E. Bousser, J. M. Mendez, Jolanta-Ewa Klemberg-Sapieha and Ludvik Martinu

Article (2024)

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Department:	Department of Engineering Physics
PolyPublie URL:	https://publications.polymtl.ca/58694/
Journal Title:	Journal of Vacuum Science & Technology A (vol. 42, no. 4)
Publisher:	AIP Publishing
DOI:	10.1116/6.0003555
Official URL:	https://doi.org/10.1116/6.0003555
Date Deposited:	26 Jun 2024 12:51
Last Modified:	26 Jun 2024 12:51

Cite in APA 7:	Varela, L. B., Avila, P. R. T., Miletić, A., Bousser, E., Mendez, J. M., Klemberg-Sapieha, J.-E., & Martinu, L. (2024). Residual stress depth profiles self-developed in cathodic arc deposited Ti-Al-N coatings prepared at different constant substrate bias values. Journal of Vacuum Science & Technology A, 42(4), 043104 (22 pages). https://doi.org/10.1116/6.0003555
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