Residual stress depth profiles self-developed in cathodic arc deposited Ti-Al-N coatings prepared at different constant substrate bias values

Luis Bernardo Varela, Pedro Renato Tavares Avila, Aleksandar Miletić, Étienne Bousser, Jaén Motta Méndez, Jolanta-Ewa Sapieha and Ludvik Martinu

Article (2024)

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Department:	Department of Engineering Physics
PolyPublie URL:	https://publications.polymtl.ca/58694/
Journal Title:	Journal of Vacuum Science & Technology A (vol. 42, no. 4)
Publisher:	AIP Publishing
DOI:	10.1116/6.0003555
Official URL:	https://doi.org/10.1116/6.0003555
Date Deposited:	26 Jun 2024 12:51
Last Modified:	08 Apr 2025 07:28

Cite in APA 7:	Varela, L. B., Tavares Avila, P. R., Miletić, A., Bousser, É., Méndez, J. M., Sapieha, J.-E., & Martinu, L. (2024). Residual stress depth profiles self-developed in cathodic arc deposited Ti-Al-N coatings prepared at different constant substrate bias values. Journal of Vacuum Science & Technology A, 42(4), 043104 (22 pages). https://doi.org/10.1116/6.0003555
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